Mr. Hideo Hoshino Profile

Hideo Hoshino

at EUVA

SPIE Involvement:

Author

Publications (17)

Proceedings Article | 18 March 2009 Paper

Paper

Laser-produced plasma source development for EUV lithography

Akira Endo, Hiroshi Komori, Yoshifumi Ueno, Krzysztof Nowak, Yabu Takayuki, Yanagida Tatsuya, Takashi Suganuma, Takeshi Asayama, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Masato Moriya, Toshihiro Nishisaka, Tamotsu Abe, Akira Sumitani, Hitoshi Nagano, Youichi Sasaki, Shinji Nagai, Yukio Watanabe, Georg Soumagne, Takanobu Ishihara, Osamu Wakabayashi, Kouji Kakizaki, Hakaru Mizoguchi

Proceedings Volume 7271, 727108 (2009) https://doi.org/10.1117/12.813639

KEYWORDS: Plasma, Tin, Carbon dioxide lasers, Extreme ultraviolet, Magnetism, Laser development, Pulsed laser operation, Extreme ultraviolet lithography, Ions, Laser systems engineering

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Proceedings Article | 21 March 2008 Paper

Paper

LPP EUV light source employing high power C02 laser

Hideo Hoshino, Takashi Suganuma, Takeshi Asayama, Krzysztof Nowak, Masato Moriya, Tamotsu Abe, Akira Endo, Akira Sumitani

Proceedings Volume 6921, 692131 (2008) https://doi.org/10.1117/12.771847

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Pulsed laser operation, Optical amplifiers, Laser systems engineering, Light sources, Oscillators, Tin, Carbon dioxide, Laser stabilization

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Proceedings Article | 20 March 2008 Paper

Paper

CO2 laser-produced Sn-plasma source for high-volume manufacturing EUV lithography

Akira Endo, Hideo Hoshino, Takashi Suganuma, Krzysztof Nowak, Tatsuya Yanagida, Takayuki Yabu, Takeshi Asayama, Yoshifumi Ueno, Masato Moriya, Masaki Nakano, Hiroshi Someya, Toshihiro Nishisaka, Tamotsu Abe, Georg Soumagne, Hiroshi Komori, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda

Proceedings Volume 6921, 69210T (2008) https://doi.org/10.1117/12.771959

KEYWORDS: Tin, Carbon dioxide lasers, Extreme ultraviolet, Ions, Magnetism, Mirrors, Plasma, Pulsed laser operation, Light sources, Carbon dioxide

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Proceedings Article | 13 September 2007 Paper

Paper

CO2 laser-produced Sn plasma as the solution for high-volume manufacturing EUV lithography

Akira Endo, Tamotsu Abe, Hideo Hoshino, Yoshifumi Ueno, Masaki Nakano, Takeshi Asayama, Hiroshi Komori, Georg Soumagne, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda

Proceedings Volume 6703, 670309 (2007) https://doi.org/10.1117/12.732254

KEYWORDS: Gas lasers, Tin, Carbon monoxide, Extreme ultraviolet, Plasma, Pulsed laser operation, Carbon dioxide lasers, Light sources, Magnetism, Ions

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Proceedings Article | 21 March 2007 Paper

Paper

Characterization of various Sn targets with respect to debris and fast ion generation

Yoshifumi Ueno, Hideo Hoshino, Tatsuya Ariga, Taisuke Miura, Masaki Nakano, Hiroshi Komori, Georg Soumagne, Akira Endo, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda

Proceedings Volume 6517, 65173B (2007) https://doi.org/10.1117/12.711226

KEYWORDS: Tin, Gas lasers, Ions, Plasma, Carbon monoxide, Nd:YAG lasers, Extreme ultraviolet, Glasses, Solids, Mirrors

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Proceedings Article | 19 March 2007 Paper

Paper

Laser-produced EUV light source development for HVM

Akira Endo, Hideo Hoshino, Takashi Suganuma, Masato Moriya, Tatsuya Ariga, Yoshifumi Ueno, Masaki Nakano, Takeshi Asayama, Tamotsu Abe, Hiroshi Komori, Georg Soumagne, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda

Proceedings Volume 6517, 65170O (2007) https://doi.org/10.1117/12.711097

KEYWORDS: Gas lasers, Carbon monoxide, Tin, Extreme ultraviolet, Plasma, Pulsed laser operation, Nd:YAG lasers, Light sources, Optical amplifiers, Ions

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Proceedings Article | 14 February 2007 Paper

Paper

High average power CO2 laser MOPA system for Tin target LPP EUV light source

Tatsuya Ariga, Hideo Hoshino, Akira Endo

Proceedings Volume 6454, 645403 (2007) https://doi.org/10.1117/12.698091

KEYWORDS: Gas lasers, Pulsed laser operation, Carbon monoxide, Extreme ultraviolet, Laser systems engineering, Tin, Light sources, Oscillators, Optical amplifiers, Extreme ultraviolet lithography

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Proceedings Article | 24 March 2006 Paper

Paper

High-power pulsed CO₂ laser for EUV lithography

Tatsuya Ariga, Hideo Hoshino, Taisuke Miura, Akira Endo

Proceedings Volume 6151, 61513M (2006) https://doi.org/10.1117/12.656804

KEYWORDS: Gas lasers, Pulsed laser operation, Carbon monoxide, Laser systems engineering, Extreme ultraviolet, Xenon, Plasma, Optical amplifiers, Oscillators, Amplifiers

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Proceedings Article | 23 March 2006 Paper

Paper

Development of CO₂ laser produced Xe plasma EUV light source for microlithography

Hakaru Mizoguchi, Akira Endo, Tatsuya Ariga, Taisuke Miura, Hideo Hoshino, Yoshifumi Ueno, Masaki Nakano, Hiroshi Komori, Akira Sumitani, Tamotsu Abe, Takashi Suganuma, Georg Soumagne, Hiroshi Someya, Yuichi Takabayashi, Koichi Toyoda

Proceedings Volume 6151, 61510S (2006) https://doi.org/10.1117/12.656941

KEYWORDS: Gas lasers, Carbon monoxide, Plasma, Pulsed laser operation, Xenon, Extreme ultraviolet, Ions, Magnetism, Laser irradiation, Oscillators

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Proceedings Article | 23 February 2006 Paper

Paper

High power and short pulse RF-excited CO₂ laser MOPA system for LLP EUV light source

Tatsuya Ariga, Hideo Hoshino, Taisuke Miura, Akira Endo

Proceedings Volume 6101, 61011N (2006) https://doi.org/10.1117/12.645607

KEYWORDS: Gas lasers, Pulsed laser operation, Carbon monoxide, Extreme ultraviolet, Laser systems engineering, Optical amplifiers, Xenon, Plasma, Oscillators, Continuous wave operation

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Proceedings Article | 31 August 2005 Paper

Paper

Development of short pulse and high power CO2 laser for EUV lithography

Akira Endo, Hideo Hoshino, Tatsuya Ariga, Taisuke Miura

Proceedings Volume 5918, 59180I (2005) https://doi.org/10.1117/12.616342

KEYWORDS: Carbon dioxide lasers, Pulsed laser operation, Extreme ultraviolet, Optical amplifiers, Xenon, Plasma, Laser systems engineering, Oscillators, Continuous wave operation, Gas lasers

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Proceedings Article | 31 August 2005 Paper

Paper

EUV characteristics of a high power and high repetition rate CO2 laser driven Xe plasma

Hiroshi Komori, Yoshifumi Ueno, Hideo Hoshino, Tatsuya Ariga, Akira Endo

Proceedings Volume 5918, 59180H (2005) https://doi.org/10.1117/12.616051

KEYWORDS: Plasma, Carbon dioxide lasers, Extreme ultraviolet, Ions, Xenon, Nd:YAG lasers, Pulsed laser operation, Laser irradiation, Light sources, Mirrors

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Proceedings Article | 6 May 2005 Paper

Paper

Laser-produced-plasma light source for EUV lithography

Georg Soumagne, Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Hiroshi Komori, Yuichi Takabayashi, Tatsuya Ariga, Yoshifumi Ueno, Yasunori Wada, Akira Endo, Koichi Toyoda

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599333

KEYWORDS: Extreme ultraviolet, Light sources, Xenon, Laser applications, Gas lasers, Laser systems engineering, Nd:YAG lasers, Oscillators, Amplifiers, Extreme ultraviolet lithography

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Proceedings Article | 20 May 2004 Paper

Paper

Ion damage analysis on EUV collector mirrors

Hiroshi Komori, Georg Soumagne, Hideo Hoshino, Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Akira Endo, Koichi Toyoda

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534060

KEYWORDS: Ions, Xenon, Plasmas, Magnetism, Mirrors, Extreme ultraviolet, Reflectivity, Microchannel plates, Light sources, Surface roughness

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Proceedings Article | 20 May 2004 Paper

Paper

Performance of a 10-kHz laser-produced-plasma light source for EUV lithography

Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Hiroshi Someya, Hideo Hoshino, Masaki Nakano, Georg Soumagne, Hiroshi Komori, Yuichi Takabayashi, Hakaru Mizoguchi, Akira Endo, Koichi Toyoda, Yasuhiro Horiike

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536076

KEYWORDS: Extreme ultraviolet, Xenon, Light sources, Plasma, Extreme ultraviolet lithography, Deformable mirrors, Mirrors, Liquids, Nd:YAG lasers, Oscillators

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Proceedings Article | 7 January 2004 Paper

Paper

Design of high-average-power clean EUV light source based on laser-produced Xenon plasma

Akira Endo, Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Hiroshi Someya, Hideo Hoshino, Nakano Masaki, Georg Soumagne, Hiroshi Komori, Yuichi Takabayashi, Hakaru Mizoguchi

Proceedings Volume 5196, (2004) https://doi.org/10.1117/12.503434

KEYWORDS: Xenon, Extreme ultraviolet, Plasma, Ions, Liquids, Absorption, Mirrors, Light sources, Data modeling, Pulsed laser operation

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Proceedings Article | 16 June 2003 Paper

Paper

Development of a liquid-jet laser-produced plasma light source for EUV lithography

Tamotsu Abe, Takashi Suganuma, Yousuke Imai, Yukihiko Sugimoto, Hiroshi Someya, Hideo Hoshino, Georg Soumagne, Hiroshi Komori, Hakaru Mizoguchi, Akira Endo, Koichi Toyoda

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.483598

KEYWORDS: Extreme ultraviolet, Xenon, Light sources, Extreme ultraviolet lithography, Plasma, Laser systems engineering, Oscillators, Liquids, Amplifiers, Temperature metrology

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Showing 5 of 17 publications

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