Hiroshi Sugimura
Senior Researcher at Toppan Printing Co Ltd
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | March 23, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Metrology, Image processing, Silicon, Process control, Photomasks, Mask making, Optical alignment, Reactive ion etching, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Electron beam lithography, Optical lithography, Scattering, Etching, Silicon, Image resolution, Photomasks, Mask making, Reactive ion etching, Semiconducting wafers

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Electron beam lithography, Reticles, Metrology, Silicon, Distortion, Photomasks, Optical alignment, Semiconducting wafers, Data corrections, Overlay metrology

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Electron beam lithography, Etching, Silicon, Distortion, Photomasks, Mask making, Critical dimension metrology, Reactive ion etching, Projection lithography

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Microelectromechanical systems, Electron beam lithography, Solids, Photomasks, Projection lithography, Charged-particle lithography

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Photovoltaics, Silicon, Distortion, Photomasks, Photomask technology, Projection lithography, Charged-particle lithography

Showing 5 of 9 publications
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