Yoshiyuki Negishi
at Toppan Printing Co Ltd
SPIE Involvement:
Publications (12)

Proceedings Article | 1 October 2013 Paper
A. Zweber, A. McGuire, M. Hibbs, S. Nash, K. Ballman, T. Faure, J. Rankin, T. Isogawa, T. Senna, Y. Negishi, M. Miller, S. Barai, D. Dechene
Proceedings Volume 8880, 88800P (2013) https://doi.org/10.1117/12.2028909
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Data modeling, Logic, Chromium, Lithography, SRAF, Metrology, Immersion lithography

Proceedings Article | 28 June 2013 Paper
Yoshiyuki Negishi, Yuki Fujita, Kazunori Seki, Toshio Konishi, Jed Rankin, Steven Nash, Emily Gallagher, Alfred Wagner, Peter Thwaite, Ahmad Elayat
Proceedings Volume 8701, 870112 (2013) https://doi.org/10.1117/12.2030765
KEYWORDS: Extreme ultraviolet lithography, Inspection, Metals, Extreme ultraviolet, Photomasks, Lithography, Tantalum, Mask making, Visualization, Computer simulations

Proceedings Article | 8 November 2012 Paper
Amy Zweber, Tom Faure, Anne McGuire, Linda Sundberg, Ratnam Sooriyakumaran, Martha Sanchez, Luisa Bozano, Tasuku Senna, Yuki Fujita, Yoshiyuki Negishi, Masahito Tanabe, Takahiro Kaneko
Proceedings Volume 8522, 85220S (2012) https://doi.org/10.1117/12.976878
KEYWORDS: Photomasks, Line edge roughness, SRAF, Manufacturing, Opacity, Critical dimension metrology, Phase shifts, Binary data, Photoresist processing, Electron beam lithography

Proceedings Article | 8 November 2012 Paper
Zhengqing John Qi, Emily Gallagher, Yoshiyuki Negishi, Gregory McIntyre, Amy Zweber, Tasuku Senna, Satoshi Akutagawa, Toshio Konishi
Proceedings Volume 8522, 85222H (2012) https://doi.org/10.1117/12.976855
KEYWORDS: Photomasks, Line edge roughness, Semiconducting wafers, Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Lithography, Lithographic illumination, Photoresist materials, Linear filtering

Proceedings Article | 23 March 2012 Paper
Proceedings Volume 8322, 83220O (2012) https://doi.org/10.1117/12.916291
KEYWORDS: Line edge roughness, Photomasks, Extreme ultraviolet, Scanning electron microscopy, Semiconducting wafers, Edge detection, Image filtering, EUV optics, Pixel resolution, Line width roughness

Showing 5 of 12 publications
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