Mr. Yoshiyuki Negishi
at Toppan Printing Co Ltd
SPIE Involvement:
Author
Publications (12)

PROCEEDINGS ARTICLE | October 1, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Lithography, Metrology, Logic, Data modeling, Chromium, Photomasks, Immersion lithography, SRAF, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | June 28, 2013
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Lithography, Visualization, Metals, Inspection, Computer simulations, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, Tantalum

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Electron beam lithography, Opacity, Manufacturing, Photomasks, SRAF, Critical dimension metrology, Line edge roughness, Photoresist processing, Binary data, Phase shifts

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Lithographic illumination, Linear filtering, Photoresist materials, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Edge detection, Scanning electron microscopy, Pixel resolution, Image filtering, Photomasks, Extreme ultraviolet, Line width roughness, Line edge roughness, Semiconducting wafers, EUV optics

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Electron beams, Metrology, Reflectivity, Chromium, Image analysis, Scanning electron microscopy, Time metrology, Precision measurement, Extreme ultraviolet, Ozone

Showing 5 of 12 publications
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