Rakesh Kumar
at Nanyang Technological Univ
SPIE Involvement:
Publications (7)

Proceedings Article | 3 May 2004 Paper
Navab Singh, S. Jagar, Sohan Mehta, Moitreyee Mukherjee Roy, Rakesh Kumar, N. Balasubramanian
Proceedings Volume 5379, (2004) https://doi.org/10.1117/12.536040
KEYWORDS: Directed energy weapons, Optical lithography, Photomasks, Lithography, Field effect transistors, Semiconducting wafers, Electron beam lithography, Reticles, Scanning electron microscopy, Scanners

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485377
KEYWORDS: Scattering, Critical dimension metrology, Binary data, Optical lithography, Photomasks, Reticles, Semiconducting wafers, Phase shifts, Modulation, Diffraction

Proceedings Article | 13 November 2002 Paper
Proceedings Volume 4936, (2002) https://doi.org/10.1117/12.476090
KEYWORDS: Photoresist processing, Etching, Plasma etching, Metals, Photoresist materials, Ions, Plasma, Reactive ion etching, Microelectromechanical systems, Gold

Proceedings Article | 24 July 2002 Paper
Moitreyee Mukherjee-Roy, Ngooi Wei, Rakesh Kumar, Satoshi Kawada
Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474270
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Lithography, Defect inspection, Microelectronics, Optical lithography, Head-mounted displays, Scanning electron microscopy, Photoresist processing, Manufacturing

Proceedings Article | 14 September 2001 Paper
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435672
KEYWORDS: Lithography, Optical lithography, Semiconducting wafers, Critical dimension metrology, Lithographic illumination, Image quality, Photomasks, Microelectronics, Roads, Metrology

Showing 5 of 7 publications
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