Mr. Sungha Woo Profile

Sungha Woo

Sr Manager at SK hynix Inc

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Profile Summary

I received the B.S. and M.S. degrees in Electronic and Electrical Engineering from Hanyang University, Seoul, Korea, in 2003 and 2006, respectively. Since February 2006, I am with the Photomask Development Team, SK hynix, Korea. I worked on 1st Patterning process and developed advanced blankmask until 2013. Most recently, I am working on management of mask defect verification with inspection and AIMS.

Publications (5)

Proceedings Article | 10 May 2016 Paper

Comparison of analysis techniques for aerial image metrology on advanced photomask

Seolchong Hwang, Sungha Woo, Heeyeon Jang, Youngmo Lee, Sangpyo Kim, Hyunjo Yang, Kristian Schulz, Anthony Garetto

Proceedings Volume 9984, 998409 (2016) https://doi.org/10.1117/12.2240301

KEYWORDS: Metrology, Photomasks, Critical dimension metrology, Image processing, Scanning electron microscopy, Semiconducting wafers, Image analysis, Error analysis, Reliability, Scanners

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Proceedings Article | 23 October 2015 Paper

A study on the factors that affect the advanced mask defect verification

Sungha Woo, Heeyeon Jang, Youngmo Lee, Sangpyo Kim, Donggyu Yim

Proceedings Volume 9635, 96351Y (2015) https://doi.org/10.1117/12.2195850

KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Lithography, Lithographic illumination, Inspection, Error analysis, Photoresist processing, Geometrical optics, Scanners

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Proceedings Article | 8 October 2014 Paper

Characteristics and issues of haze management in a wafer fabrication environment

Sung Ha Woo, Goo Min Jeong, Young Mo Lee, Sang Pyo Kim, Dong Gyu Yim, Dae Ho Hwang

Proceedings Volume 9235, 923524 (2014) https://doi.org/10.1117/12.2066275

KEYWORDS: Air contamination, Photomasks, Laser therapeutics, Pellicles, Semiconducting wafers, Metrology, Critical dimension metrology, Laser processing, Inspection, Chromium

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Proceedings Article | 8 November 2012 Paper

CD uniformity improvement through elimination of hardware influences on post-exposure bake

Sung Ha Woo, Eui-Sang Park, Sang Pyo Kim, Dong Gyu Yim, Osamu Katada, Tobias Wähler, Peter Dress, Uwe Dietze, Jong Hoon Lim

Proceedings Volume 8522, 85222L (2012) https://doi.org/10.1117/12.979470

KEYWORDS: Sensors, Mirrors, Photomasks, Photoresist processing, Temperature metrology, Manufacturing, Optimization (mathematics), Photoresist materials, Etching, Critical dimension metrology

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Proceedings Article | 17 October 2008 Paper

The study of CD behavior due to transmission control position change within photomask substrate

Kangjoon Seo, Sungha Woo, Hyemi Lee, Munsik Kim, Yongkyoo Choi, Changyeol Kim

Proceedings Volume 7122, 712239 (2008) https://doi.org/10.1117/12.801432

KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Quartz, Control systems, Printing, Refractive index, Laser scattering, Optical lithography, Ultrafast lasers

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