Chemical reactions induced by low-energy electron exposure on a novel inorganic-organic hybrid dry EUV photoresist deposited by molecular atomic layer deposition (MALD)

Dan N. Le; Su Min Hwang; Jihoon Woo; Seungsoo Choi; Taehee Park; Jean-Francois Veyan; Nikhil Tiwale; Ashwanth Subramanian; Won-Il Lee; Chang-Yong Nam; Rino Choi; Jiyoung Kim

doi:10.1117/12.2641647

1 December 2022 Chemical reactions induced by low-energy electron exposure on a novel inorganic-organic hybrid dry EUV photoresist deposited by molecular atomic layer deposition (MALD)

Dan N. Le, Su Min Hwang, Jihoon Woo, Seungsoo Choi, Taehee Park, Jean-Francois Veyan, Nikhil Tiwale, Ashwanth Subramanian, Won-Il Lee, Chang-Yong Nam, Rino Choi, Jiyoung Kim

Author Affiliations +

Proceedings Volume 12292, International Conference on Extreme Ultraviolet Lithography 2022; 1229205 (2022) https://doi.org/10.1117/12.2641647
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States

Abstract

Herein, we investigated the chemical reactions associated with low-energy electron exposures on an inorganic-organic hybrid thin film system deposited using molecular atomic layer deposition (MALD) for EUV photoresist applications. Using the hybrid thin films consisting of trimethylaluminum (TMA) and hydroquinone (HQ), we determined the critical doses and thickness contrast of the hybrid materials at various electron energies (up to 400 eV). The custom-built in-situ Fourier-Transform Infrared (FTIR) spectroscopy system, equipped with an electron flood gun and gas residual analyzer (RGA), was employed to monitor the chemical changes induced by low-energy electrons in the hybrid thin films. Based on the in-situ FTIR and RGA results, potential chemical reaction mechanisms responsible for the change in solubility of the TMA/HQ material are proposed.

Conference Presentation

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Dan N. Le, Su Min Hwang, Jihoon Woo, Seungsoo Choi, Taehee Park, Jean-Francois Veyan, Nikhil Tiwale, Ashwanth Subramanian, Won-Il Lee, Chang-Yong Nam, Rino Choi, and Jiyoung Kim "Chemical reactions induced by low-energy electron exposure on a novel inorganic-organic hybrid dry EUV photoresist deposited by molecular atomic layer deposition (MALD)", Proc. SPIE 12292, International Conference on Extreme Ultraviolet Lithography 2022, 1229205 (1 December 2022); https://doi.org/10.1117/12.2641647

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