Dr. Nikhil M. Tiwale
Research Staff at Brookhaven National Lab
SPIE Involvement:
Area of Expertise:
Nanofabrication , Lithography , Infiltration Synthesis , Atomic Layer Deposition (ALD) , Field Effect Transistors
Profile Summary

Scientific Associate III, Brookhaven National Laboratory (Sept. 2021 - Present)
Research Associate, Brookhaven National Laboratory (Mar. 2018 - Sept. 2021)
Silicon Process Engineer, Adaptix Ltd (Oct. 2017 – Mar. 2018)

Ph.D. Engineering, University of Cambridge, UK (2017)
B.Tech. + M.Tech., Metallurgical Engineering & Materials Science, Indian Institute of Technology Bombay, India (2012)
Specialization – Ceramics and Composites

Nikhil Tiwale is a Scientific Associate at CFN/BNL Electronic Nanomaterials group, who previously also conducted postdoctoral research with Dr Chang-Yong Nam in the same group. He obtained his PhD from the University of Cambridge in 2017 on developing direct-write EBL technique for making ZnO nanoFETs and gas sensors, under the supervision of Prof. Sir Mark Welland. Before joining BNL, he briefly worked at Adaptix Ltd, as a silicon process engineer.
Publications (11)

Proceedings Article | 9 April 2024 Presentation + Paper
Dan Le, Thi Thu Huong Chu, Jin-Hyun Kim, Jean-Francois Veyan, Won-Il Lee, Nikhil Tiwale, Minjong Lee, Seungsoo Choi, Jihoon Woo, Chang-Yong Nam, Rino Choi, Jiyoung Kim
Proceedings Volume 12957, 129570B (2024) https://doi.org/10.1117/12.3010970
KEYWORDS: Thin films, Film thickness, X-ray photoelectron spectroscopy, Atomic layer deposition, Chemical analysis, Aluminum, Carbon monoxide, Materials science, Extreme ultraviolet lithography, Engineering

Proceedings Article | 30 April 2023 Presentation
Proceedings Volume 12498, 1249810 (2023) https://doi.org/10.1117/12.2658685
KEYWORDS: High volume manufacturing, Extreme ultraviolet lithography, Atomic layer deposition, Photoresist materials, Electron beam lithography, Thin films, Silicon, Resistance, Polymethylmethacrylate, Photoresist processing

Proceedings Article | 30 April 2023 Presentation
Proceedings Volume 12498, 124981A (2023) https://doi.org/10.1117/12.2658659
KEYWORDS: Optical lithography, Oxides, Metals, Polymer thin films, Nanolithography, Nanocomposites, Materials processing, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet

Proceedings Article | 1 December 2022 Presentation + Paper
Proceedings Volume 12292, 1229205 (2022) https://doi.org/10.1117/12.2641647
KEYWORDS: Thin films, Extreme ultraviolet lithography, Electron beam lithography, FT-IR spectroscopy, Photoresist materials, Chemical reactions, Floods, Atomic layer deposition, Chemical analysis, Thin film deposition

Proceedings Article | 11 November 2022 Presentation
Proceedings Volume PC12292, PC122920K (2022) https://doi.org/10.1117/12.2641794
KEYWORDS: Extreme ultraviolet lithography, Reactive ion etching, Photoresist materials, Atomic layer deposition, Electron beam lithography, Thin films, Photoresist developing, Etching, Semiconductors, Photons

Showing 5 of 11 publications
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