Dr. Nikhil M. Tiwale Profile

Dr. Nikhil M. Tiwale

Research Staff at Brookhaven National Lab

SPIE Involvement:

Author

Area of Expertise:

Nanofabrication , Lithography , Infiltration Synthesis , Atomic Layer Deposition (ALD) , Field Effect Transistors

Websites:

Company Website

PROFESSIONAL APPOINTMENT:
Scientific Associate III, Brookhaven National Laboratory (Sept. 2021 - Present)
Research Associate, Brookhaven National Laboratory (Mar. 2018 - Sept. 2021)
Silicon Process Engineer, Adaptix Ltd (Oct. 2017 – Mar. 2018)

EDUCATION:
Ph.D. Engineering, University of Cambridge, UK (2017)
B.Tech. + M.Tech., Metallurgical Engineering & Materials Science, Indian Institute of Technology Bombay, India (2012)
Specialization – Ceramics and Composites

BIOGRAPHY:
Nikhil Tiwale is a Scientific Associate at CFN/BNL Electronic Nanomaterials group, who previously also conducted postdoctoral research with Dr Chang-Yong Nam in the same group. He obtained his PhD from the University of Cambridge in 2017 on developing direct-write EBL technique for making ZnO nanoFETs and gas sensors, under the supervision of Prof. Sir Mark Welland. Before joining BNL, he briefly worked at Adaptix Ltd, as a silicon process engineer.

Proceedings Article | 9 April 2024 Presentation + Paper

Understanding the stability of advanced inorganic-organic hybrid thin films for advanced resist applications

Dan Le, Thi Thu Huong Chu, Jin-Hyun Kim, Jean-Francois Veyan, Won-Il Lee, Nikhil Tiwale, Minjong Lee, Seungsoo Choi, Jihoon Woo, Chang-Yong Nam, Rino Choi, Jiyoung Kim

Proceedings Volume 12957, 129570B (2024) https://doi.org/10.1117/12.3010970

KEYWORDS: Thin films, Film thickness, X-ray photoelectron spectroscopy, Atomic layer deposition, Chemical analysis, Aluminum, Carbon monoxide, Materials science, Extreme ultraviolet lithography, Engineering

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Proceedings Article | 30 April 2023 Presentation

Atomic layer deposition derived organic-inorganic hybrid EUV photoresists

Ashwanth Subramanian, Dan Le, Su Min Hwang, Nikhil Tiwale, Won-Il Lee, Kim Kisslinger, Ming Lu, Aaron Stein, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume 12498, 1249810 (2023) https://doi.org/10.1117/12.2658685

KEYWORDS: High volume manufacturing, Extreme ultraviolet lithography, Atomic layer deposition, Photoresist materials, Electron beam lithography, Thin films, Silicon, Resistance, Polymethylmethacrylate, Photoresist processing

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Proceedings Article | 30 April 2023 Presentation

Hybrid positive-tone resist synthesis via vapor phase infiltration for contact-hole patterning

Nikhil Tiwale, Ashwanth Subramanian, Won-Il Lee, Ming Lu, Aaron Stein, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume 12498, 124981A (2023) https://doi.org/10.1117/12.2658659

KEYWORDS: Optical lithography, Oxides, Metals, Polymer thin films, Nanolithography, Nanocomposites, Materials processing, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet

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Proceedings Article | 1 December 2022 Presentation + Paper

Chemical reactions induced by low-energy electron exposure on a novel inorganic-organic hybrid dry EUV photoresist deposited by molecular atomic layer deposition (MALD)

Dan Le, Su Min Hwang, Jihoon Woo, Seungsoo Choi, Taehee Park, Jean-Francois Veyan, Nikhil Tiwale, Ashwanth Subramanian, Won-Il Lee, Chang-Yong Nam, Rino Choi, Jiyoung Kim

Proceedings Volume 12292, 1229205 (2022) https://doi.org/10.1117/12.2641647

KEYWORDS: Thin films, Extreme ultraviolet lithography, Electron beam lithography, FT-IR spectroscopy, Photoresist materials, Chemical reactions, Floods, Atomic layer deposition, Chemical analysis, Thin film deposition

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Proceedings Article | 11 November 2022 Presentation

Low-energy electron exposure and reactive ion etching characteristics of hybrid EUV photoresist synthesized by molecular atomic layer deposition

Won-Il Lee, Ashwanth Subramanian, Nikhil Tiwale, Dan Le, Su Min Hwang, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume PC12292, PC122920K (2022) https://doi.org/10.1117/12.2641794

KEYWORDS: Extreme ultraviolet lithography, Reactive ion etching, Photoresist materials, Atomic layer deposition, Electron beam lithography, Thin films, Photoresist developing, Etching, Semiconductors, Photons

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Proceedings Article | 11 November 2022 Presentation

EUVL characteristics of indium-oxide-infiltrated PMMA hybrid photoresist synthesized by vapor-phase infiltration

Ashwanth Subramanian, Nikhil Tiwale, Won-Il Lee, Kim Kisslinger, Ming Lu, Aaron Stein, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume PC12292, PC122920L (2022) https://doi.org/10.1117/12.2643226

KEYWORDS: Extreme ultraviolet lithography, Polymethylmethacrylate, Photoresist materials, Silicon, Resistance, Indium oxide, Etching, Electron beam lithography, Dry etching, Plasma

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Proceedings Article | 13 June 2022 Presentation

Infiltration synthesis: paving way for uniquely functional hybrids and direct-writing optoelectronic nanostructures

Nikhil Tiwale, Ashwanth Subramanian, Kim Kisslinger, Ming Lu, Aaron Stein, Chang-Yong Nam

Proceedings Volume PC12054, PC120540G (2022) https://doi.org/10.1117/12.2618064

KEYWORDS: Nanostructures, Optoelectronics, Thin films, Thin film devices, Polymers, Polymer thin films, Photoresist materials, Oxides, Optoelectronic devices, Microelectromechanical systems

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SPIE Journal Paper | 2 June 2022 Open Access

Review of metal-containing resists in electron beam lithography: perspectives for extreme ultraviolet patterning

Mohammad S. Saifullah, Nikhil Tiwale, Ramakrishnan Ganesan

JM3, Vol. 21, Issue 04, 041402, (June 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.4.041402

KEYWORDS: Electron beam lithography, Metals, Electron beams, Oxides, Aluminum, Extreme ultraviolet lithography, Zinc, Lithography, Line edge roughness, Extreme ultraviolet

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Proceedings Article | 30 September 2021 Poster + Presentation

Photochemical study of metal infiltrated e-beam resist using vapor-phase infiltration for EUV applications

Su Min Hwang, Aditya Raja Gummadavelly, Dan Le, Yong Chan Jung, Jean-Francois Veyan, Nikhill Tiwale, Chang-Yong Nam, Jinho Ahn, Jiyoung Kim

Proceedings Volume 11854, 118541C (2021) https://doi.org/10.1117/12.2601033

KEYWORDS: Extreme ultraviolet, Metals, Atomic layer deposition, Polymethylmethacrylate, Photoresist processing, FT-IR spectroscopy, Extreme ultraviolet lithography, Silicon, Resistance, Printed circuit board testing

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Proceedings Article | 22 February 2021 Presentation + Paper

Hybrid resist synthesis by ex-situ vapor-phase infiltration of metal oxides into conventional organic resists

Nikhil Tiwale, Ashwanth Subramanian, Guillaume Freychet, Eliot Gann, Kim Kisslinger, Ming Lu, Aaron Stein, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume 11612, 116120A (2021) https://doi.org/10.1117/12.2583908

KEYWORDS: Etching, Oxides, Metals, Extreme ultraviolet, Resistance, Optical lithography, Silicon, Scanning transmission electron microscopy, Plasma etching, Nanolithography

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Proceedings Article | 23 March 2020 Presentation + Paper

Infiltration synthesis of hybrid nanocomposite resists for advanced nanolithography

Nikhil Tiwale, Ashwanth Subramanian, Kim Kisslinger, Ming Lu, Jiyoung Kim, Aaron Stein, Chang-Yong Nam

Proceedings Volume 11326, 113260J (2020) https://doi.org/10.1117/12.2552164

KEYWORDS: Etching, Electron beam lithography, Extreme ultraviolet lithography, Polymethylmethacrylate, Atomic layer deposition

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