Dr. Su Min Hwang Profile

Dr. Su Min Hwang

at Univ of Texas at Dallas

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 30 April 2023 Presentation

Atomic layer deposition derived organic-inorganic hybrid EUV photoresists

Ashwanth Subramanian, Dan Le, Su Min Hwang, Nikhil Tiwale, Won-Il Lee, Kim Kisslinger, Ming Lu, Aaron Stein, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume 12498, 1249810 (2023) https://doi.org/10.1117/12.2658685

KEYWORDS: High volume manufacturing, Extreme ultraviolet lithography, Atomic layer deposition, Photoresist materials, Electron beam lithography, Thin films, Silicon, Resistance, Polymethylmethacrylate, Photoresist processing

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Proceedings Article | 1 December 2022 Presentation + Paper

Chemical reactions induced by low-energy electron exposure on a novel inorganic-organic hybrid dry EUV photoresist deposited by molecular atomic layer deposition (MALD)

Dan Le, Su Min Hwang, Jihoon Woo, Seungsoo Choi, Taehee Park, Jean-Francois Veyan, Nikhil Tiwale, Ashwanth Subramanian, Won-Il Lee, Chang-Yong Nam, Rino Choi, Jiyoung Kim

Proceedings Volume 12292, 1229205 (2022) https://doi.org/10.1117/12.2641647

KEYWORDS: Thin films, Extreme ultraviolet lithography, Electron beam lithography, FT-IR spectroscopy, Photoresist materials, Chemical reactions, Floods, Atomic layer deposition, Chemical analysis, Thin film deposition

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Proceedings Article | 11 November 2022 Presentation

Low-energy electron exposure and reactive ion etching characteristics of hybrid EUV photoresist synthesized by molecular atomic layer deposition

Won-Il Lee, Ashwanth Subramanian, Nikhil Tiwale, Dan Le, Su Min Hwang, Jiyoung Kim, Chang-Yong Nam

Proceedings Volume PC12292, PC122920K (2022) https://doi.org/10.1117/12.2641794

KEYWORDS: Extreme ultraviolet lithography, Reactive ion etching, Photoresist materials, Atomic layer deposition, Electron beam lithography, Thin films, Photoresist developing, Etching, Semiconductors, Photons

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Proceedings Article | 30 September 2021 Poster + Presentation

Photochemical study of metal infiltrated e-beam resist using vapor-phase infiltration for EUV applications

Su Min Hwang, Aditya Raja Gummadavelly, Dan Le, Yong Chan Jung, Jean-Francois Veyan, Nikhill Tiwale, Chang-Yong Nam, Jinho Ahn, Jiyoung Kim

Proceedings Volume 11854, 118541C (2021) https://doi.org/10.1117/12.2601033

KEYWORDS: Extreme ultraviolet, Metals, Atomic layer deposition, Polymethylmethacrylate, Photoresist processing, FT-IR spectroscopy, Extreme ultraviolet lithography, Silicon, Resistance, Printed circuit board testing

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