Sub-80-nm contact hole patterning using Step and Flash Imprint Lithography

David P. Mancini; Ngoc Le; Kathleen A. Gehoski; Steven Young; William J. Dauksher; Kevin J. Nordquist; Douglas J. Resnick

doi:10.1117/12.537382

20 May 2004 Sub-80-nm contact hole patterning using Step and Flash Imprint Lithography

David P. Mancini, Ngoc Le, Kathleen A. Gehoski, Steven Young, William J. Dauksher, Kevin J. Nordquist, Douglas J. Resnick

Author Affiliations +

Proceedings Volume 5374, Emerging Lithographic Technologies VIII; (2004) https://doi.org/10.1117/12.537382
Event: Microlithography 2004, 2004, Santa Clara, California, United States

Abstract

Recently, the International Roadmap for Semiconductors (ITRS) has included imprint lithography on its roadmap, to be ready for production use in 2013 at the 32 nm node. Step and Flash Imprint Lithography (S-FIL^TM) is one of the promising new methods of imprint lithography being actively developed. Since S-FIL is a 1X printing technique, fabrication of templates is especially critical. S-FIL has previously demonstrated the ability to reliably print high resolution line/space and contact hole features into a silicon-rich etch barrier material. Beyond printing with S-FIL however, there is the requirement to develop low or zero bias, high selectivity dry etch processes needed to transfer printed images into the substrate. In this study, the feasibility and methodology of imprinting sub-80 nm contacts, and pattern transferring this image into an underlying oxide layer is demonstrated. Critical parameters such as e-beam dose and etch biases associated with template pillar fabrication, and biases associated with pattern transfer processes for sub-80 nm 1:1 and 1:2 pitch contacts are discussed. Wafer imprinting was done on 200 mm wafers using Molecular Imprints Inc., Imprio 100^TM system.

Citation Download Citation

David P. Mancini, Ngoc Le, Kathleen A. Gehoski, Steven Young, William J. Dauksher, Kevin J. Nordquist, and Douglas J. Resnick "Sub-80-nm contact hole patterning using Step and Flash Imprint Lithography", Proc. SPIE 5374, Emerging Lithographic Technologies VIII, (20 May 2004); https://doi.org/10.1117/12.537382

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available