High-resolution defect inspection of step-and-flash imprint lithography for 32-nm half-pitch patterning
High resolution defect inspection of step and flash imprint lithography for 32 nm half-pitch patterning
Step and flash imprint process integration techniques for photonic crystal patterning: template replication through wafer patterning irrespective of tone
Fabrication of nano-imprint templates for dual-Damascene applications using a high resolution variable shape E-beam writer
Whole wafer imprint patterning using step and flash imprint lithography: a manufacturing solution for sub-100-nm patterning
Step and flash imprint lithography (S-FIL) is an attractive method for printing sub-100-nm geometries. Relative to other imprinting processes, S-FIL has the advantage of the template being transparent, thereby facilitating conventional overlay techniques.
Advanced negative i-line resist development on metal surfaces for next-generation lithography mask fabrication