William J. Dauksher
at Motorola Inc
SPIE Involvement:
Author
Publications (34)

PROCEEDINGS ARTICLE | May 3, 2007
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Lithography, Electron beams, Silica, Etching, Chromium, Atomic force microscopy, Scanning electron microscopy, Photomasks, Nanoimprint lithography, Liquids

PROCEEDINGS ARTICLE | March 15, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Wafer-level optics, Lithography, Etching, Quartz, Particles, Manufacturing, Resistance, Scanning electron microscopy, Optical inspection, Semiconducting wafers

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Logic, Silica, Etching, Metals, Inspection, Chromium, Scanning electron microscopy, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Oxides, Lithography, Etching, Silicon, Scanning electron microscopy, Printing, Nanoimprint lithography, Critical dimension metrology, Semiconducting wafers, Plasma

PROCEEDINGS ARTICLE | March 23, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Lithography, Opacity, Etching, Quartz, Image processing, Chromium, Atomic force microscopy, Scanning electron microscopy, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Lithography, Logic, Defect detection, Silica, Databases, Metals, Inspection, Chromium, Photomasks, Semiconducting wafers

Showing 5 of 34 publications
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