William J. Dauksher
at Motorola Solutions Inc
SPIE Involvement:
Publications (34)

Proceedings Article | 3 May 2007 Paper
Proceedings Volume 6533, 65330P (2007) https://doi.org/10.1117/12.736921
KEYWORDS: Silica, Photomasks, Lithography, Etching, Electron beams, Scanning electron microscopy, Chromium, Atomic force microscopy, Nanoimprint lithography, Liquids

Proceedings Article | 15 March 2007 Paper
W. Dauksher, N. Le, K. Gehoski, E. Ainley, K. Nordquist, N. Joshi
Proceedings Volume 6517, 651714 (2007) https://doi.org/10.1117/12.712376
KEYWORDS: Semiconducting wafers, Resistance, Lithography, Scanning electron microscopy, Etching, Wafer-level optics, Particles, Optical inspection, Manufacturing, Quartz

Proceedings Article | 20 October 2006 Paper
M. Tsuneoka, T. Hasebe, T. Tokumoto, C. Yan, M. Yamamoto, D. Resnick, E. Thompson, H. Wakamori, M. Inoue, Eric Ainley, Kevin Nordquist, William Dauksher
Proceedings Volume 6349, 63492D (2006) https://doi.org/10.1117/12.687196
KEYWORDS: Inspection, Silica, Semiconducting wafers, Metals, Lithography, Scanning electron microscopy, Photomasks, Chromium, Logic, Etching

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6151, 61512K (2006) https://doi.org/10.1117/12.657488
KEYWORDS: Etching, Lithography, Oxides, Critical dimension metrology, Nanoimprint lithography, Scanning electron microscopy, Semiconducting wafers, Printing, Silicon, Plasma

Proceedings Article | 23 March 2006 Paper
L. Jeff Myron, Ecron Thompson, Ian McMackin, Douglas Resnick, Tadashi Kitamura, Toshiaki Hasebe, Shinichi Nakazawa, Toshifumi Tokumoto, Eric Ainley, Kevin Nordquist, William Dauksher
Proceedings Volume 6151, 61510M (2006) https://doi.org/10.1117/12.659457
KEYWORDS: Inspection, Metals, Lithography, Silica, Logic, Semiconducting wafers, Defect detection, Photomasks, Chromium, Databases

Showing 5 of 34 publications
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