An electrical defectivity characterization of wafers imprinted with step and flash imprint lithography
Evaluation of FIB and e-beam repairs for implementation on step and flash imprint lithography templates
Development of phase shift masks for extreme ultraviolet lithography and optical evaluation of phase shift materials
Step and flash imprint lithography (S-FIL) is an attractive method for printing sub-100-nm geometries. Relative to other imprinting processes, S-FIL has the advantage of the template being transparent, thereby facilitating conventional overlay techniques.
Design and method of fabricating phase-shift masks for extreme-ultraviolet lithography by partial etching into the EUV multilayer mirror
Fabrication process and transmission characteristics of SCALPEL mask blanks with thin SiNx membranes
Advanced negative i-line resist development on metal surfaces for next-generation lithography mask fabrication