Special Section Guest Editorial: Alternative Lithographic Technologies

9 August 2012 Special Section Guest Editorial: Alternative Lithographic Technologies

William M. Tong, Douglas J. Resnick, Benjamen M. Rathsack

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William M. Tong, Douglas J. Resnick, and Benjamen M. Rathsack "Special Section Guest Editorial: Alternative Lithographic Technologies," Journal of Micro/Nanolithography, MEMS, and MOEMS 11(3), 031401 (9 August 2012). https://doi.org/10.1117/1.JMM.11.3.031401

Published: 9 August 2012

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KEYWORDS

Lithography

Directed self assembly

Explosives

Nanoimprint lithography

Optical lithography

Double patterning technology

Immersion lithography

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