Dr. David M. Owen
VP Technology at Ultratech Inc
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Thin films, Metrology, Scanners, Distortion, Silicon films, Process control, Semiconductor manufacturing, Forward error correction, Semiconducting wafers, Overlay metrology, Lithographic metrology, Lithographic process control

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Lithography, Optical lithography, Data modeling, Scanners, Interferometry, Distortion, Process control, High volume manufacturing, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Interferometers, Image processing, Scanners, Manufacturing, Inspection, Interferometry, Control systems, Process control, Semiconducting wafers, Overlay metrology, Defect inspection

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Thin films, Lithography, Phase shifting, Metrology, Interferometers, Annealing, Inspection, Data acquisition, Semiconducting wafers, Overlay metrology

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