David Laidler
Researcher Advanced Lithography at imec
SPIE Involvement:
Publications (35)

Proceedings Article | 28 March 2017 Paper
Leon van Dijk, Jeffrey Mileham, Ilja Malakhovsky, David Laidler, Harold Dekkers, Sven Van Elshocht, Doug Anberg, David Owen, Richard van Haren
Proceedings Volume 10145, 101452L (2017) https://doi.org/10.1117/12.2257475
KEYWORDS: Lithographic process control, Forward error correction, Distortion, Lithographic metrology, Semiconducting wafers, Overlay metrology, Scanners, Metrology, Thin films, Process control, Silicon films, Semiconductor manufacturing

Proceedings Article | 28 March 2016 Paper
Safak Sayan, Taisir Marzook, BT Chan, Nadia Vandenbroeck, Arjun Singh, David Laidler, Efrain Sanchez, Philippe Leray, Paulina R. Delgadillo, Roel Gronheid, Geert Vandenberghe, William Clark, Aurelie Juncker
Proceedings Volume 9779, 97790R (2016) https://doi.org/10.1117/12.2220120
KEYWORDS: Directed self assembly, Optical lithography, Optical alignment, Semiconducting wafers, Etching, Photomasks, Image processing, Scanners, Wafer-level optics

Proceedings Article | 12 April 2013 Paper
Proceedings Volume 8683, 868306 (2013) https://doi.org/10.1117/12.2011968
KEYWORDS: Optical alignment, Etching, Back end of line, Metals, Copper, Double patterning technology, Chemical mechanical planarization, Scanners, Neodymium, Optical lithography

Proceedings Article | 1 April 2013 Paper
Proceedings Volume 8679, 86791K (2013) https://doi.org/10.1117/12.2012136
KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Etching, Extreme ultraviolet, Reticles, Critical dimension metrology, Optical lithography, Line width roughness, Manufacturing, Overlay metrology

Proceedings Article | 4 April 2012 Paper
Proceedings Volume 8324, 832409 (2012) https://doi.org/10.1117/12.918017
KEYWORDS: Overlay metrology, Scanners, Etching, Optical design, Silicon, Metrology, Semiconducting wafers, Reticles, Diffraction, Neodymium

Showing 5 of 35 publications
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