Mr. Hideaki Hamada Profile

Hideaki Hamada

CTO at HTL Co Japan Ltd

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 21 November 2023 Presentation + Paper

Providing solutions for replacement of legacy tools with advanced features

H. Hamada, K. Egami, S. Kanai, A. Gupta, S. Murakami, K. Nakanishi, K. Matsumura, A. Acharya

Proceedings Volume 12751, 127510J (2023) https://doi.org/10.1117/12.2686670

KEYWORDS: Manufacturing, Mask making, Manufacturing equipment, Inspection, Artificial intelligence, Semiconductors, Classification systems, Photomasks

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Proceedings Article | 29 September 2023 Paper

Approach to AI defect classification for photomask inspection equipment using EOI-AI software package developed by HTL

H. Hamada, K. Matsumura, A. Gupta, N. Das, A. Abu, H. Agarwal, S. Acharya, K. Egami, K. Nakanishi, S. Kanai, F. Yoshida, A. Acharya

Proceedings Volume 12915, 129150K (2023) https://doi.org/10.1117/12.2684573

KEYWORDS: Artificial intelligence, Reflection, Image classification, Deep learning, Photomasks, Inspection, Inspection equipment, Education and training, Defect detection, Chromium

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Proceedings Article | 15 May 2007 Paper

A study of EB pattern write system design for 22-nm node and beyond

Shuichi Tamamushi, Hideaki Hamada

Proceedings Volume 6607, 660722 (2007) https://doi.org/10.1117/12.728985

KEYWORDS: Data processing, Transistors, Electron beams, Optical proximity correction, Photomasks, Resolution enhancement technologies, Vestigial sideband modulation, Electron beam melting, Data conversion, Data modeling

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Proceedings Article | 30 December 1999 Paper

PMJ' 99 panel discussion review: OPC mask technology for KrF lithography

Hiroichi Kawahira, Naoya Hayashi, Hideaki Hamada

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373327

KEYWORDS: Photomasks, Optical proximity correction, Inspection, Critical dimension metrology, Lithography, Defect inspection, Manufacturing, Mask making, Semiconducting wafers, Optics manufacturing

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Proceedings Article | 18 December 1998 Paper

Issues on mask technologies: 0.18-um and beyond

Naoya Hayashi, Hiroichi Kawahira, Hideaki Hamada

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332841

KEYWORDS: Photomasks, Reticles, Defect inspection, Logic devices, Manufacturing, Mask making, Error analysis, Optical proximity correction, Printing, Logic

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Proceedings Article | 12 February 1997 Paper

Next-generation mask strategy: are technologies ready for mass production of 256 MDRAM? Summary of Photomask Japan '97 Panel Discussion

Hiroaki Morimoto, Naoya Hayashi, Hideaki Hamada

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301189

KEYWORDS: Photomasks, Optical proximity correction, Defect inspection, Phase shifts, Etching, Printing, Lithography, Error analysis, Inspection, Optical lithography

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