Mr. Naoya Hayashi
Research Fellow at Dai Nippon Printing Co Ltd
SPIE Involvement:
Fellow status | Conference Program Committee | Conference Chair | Symposium Chair | Conference Co-Chair | Author | Editor
Publications (166)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Nanostructures, 3D acquisition, Scattering, Quartz, Ultraviolet radiation, X-rays, Scanning electron microscopy, 3D metrology, Nanoimprint lithography, Critical dimension metrology

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Nanostructures, Scattering, Quartz, X-rays, 3D modeling, Scanning electron microscopy, Transmission electron microscopy, 3D metrology, Nanoimprint lithography, Critical dimension metrology

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Nanostructures, Scattering, Quartz, X-rays, 3D modeling, Scanning electron microscopy, Transmission electron microscopy, 3D metrology, Nanoimprint lithography, Critical dimension metrology

PROCEEDINGS ARTICLE | May 18, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Nanostructures, Diffraction, Scattering, Quartz, X-rays, Nondestructive evaluation, Transmission electron microscopy, Nanoimprint lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Mirrors, Multilayers, Radon, Image processing, Scanning electron microscopy, Transmission electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing

SPIE Journal Paper | February 5, 2016
JM3 Vol. 15 Issue 02
KEYWORDS: Nanoimprint lithography, High volume manufacturing, Image processing, Critical dimension metrology, Lithography, Semiconductors, Semiconducting wafers, Photomasks, Ultraviolet radiation, Liquids

Showing 5 of 166 publications
Conference Committee Involvement (39)
Novel Patterning Technologies 2018
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Photomask Technology
11 September 2017 | Monterey, California, United States
33rd European Mask and Lithography Conference
26 June 2017 | Dresden, Germany
Emerging Patterning Technologies 2017
27 February 2017 | San Jose, California, United States
Showing 5 of 39 published special sections
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