Mr. Naoya Hayashi
Research Fellow at Dai Nippon Printing Co Ltd
SPIE Involvement:
Fellow status | Conference Program Committee | Conference Chair | Symposium Chair | Conference Co-Chair | Author | Editor
Publications (168)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Semiconductors, Lithography, Photomasks, Nanoimprint lithography

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Nanostructures, 3D acquisition, Scattering, Quartz, Ultraviolet radiation, X-rays, Scanning electron microscopy, 3D metrology, Nanoimprint lithography, Critical dimension metrology

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Nanostructures, Scattering, Quartz, X-rays, 3D modeling, Scanning electron microscopy, Transmission electron microscopy, 3D metrology, Nanoimprint lithography, Critical dimension metrology

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Nanostructures, Scattering, Quartz, X-rays, 3D modeling, Scanning electron microscopy, Transmission electron microscopy, 3D metrology, Nanoimprint lithography, Critical dimension metrology

PROCEEDINGS ARTICLE | April 27, 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Optical lithography, Printing, Photomasks, Extreme ultraviolet lithography, Nanoimprint lithography, Semiconducting wafers, Current controlled current source

PROCEEDINGS ARTICLE | May 18, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Nanostructures, Diffraction, Scattering, Quartz, X-rays, Nondestructive evaluation, Transmission electron microscopy, Nanoimprint lithography, Semiconducting wafers

Showing 5 of 168 publications
Conference Committee Involvement (42)
Extreme Ultraviolet (EUV) Lithography X
24 February 2019 | San Jose, California, United States
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2019
24 February 2019 | San Jose, California, United States
Photomask Technology
17 September 2018 | Monterey, California, United States
Novel Patterning Technologies 2018
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Showing 5 of 42 published special sections
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