Dr. Hiroaki Morimoto
Meister, Senior Chief Researcher at Toppan Printing Co Ltd
SPIE Involvement:
Conference Program Committee | Conference Co-Chair | Symposium Committee | Conference Chair | Symposium Chair | Author | Editor
Publications (43)

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Reticles, Deep ultraviolet, Scanners, Reflectivity, Atomic force microscopy, Photomasks, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | July 28, 2014
Proc. SPIE. 9256, Photomask and Next-Generation Lithography Mask Technology XXI
KEYWORDS: Reticles, Deep ultraviolet, Scanners, Reflectivity, Atomic force microscopy, 3D metrology, Photomasks, Extreme ultraviolet, Neodymium, Semiconducting wafers

PROCEEDINGS ARTICLE | October 3, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Reticles, Deep ultraviolet, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Semiconductors, Lithography, Reticles, Metrology, Scanning electron microscopy, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Radium

PROCEEDINGS ARTICLE | June 30, 2012
Proc. SPIE. 8441, Photomask and Next-Generation Lithography Mask Technology XIX
KEYWORDS: Deep ultraviolet, Etching, Image processing, Manufacturing, Inspection, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 43 publications
Conference Committee Involvement (14)
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography V
24 February 2014 | San Jose, California, United States
Showing 5 of 14 published special sections
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