Mr. Hiroichi Kawahira Profile

Hiroichi Kawahira

CEO at Samsung Japan Corporation

SPIE Involvement:

Author

Publications (48)

Proceedings Article | 30 October 2007 Paper

Compositional analysis of progressive defects on a photomask

Koichiro Saga, Hiroichi Kawahira

Proceedings Volume 6730, 673019 (2007) https://doi.org/10.1117/12.746375

KEYWORDS: Ions, Photomasks, Reticles, Raman spectroscopy, Contamination, Carbon, Chemical species, Sodium, Magnesium, Aluminum

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Proceedings Article | 29 March 2006 Paper

Optimization of dual BARC structures for hyper-NA immersion lithography

Nobuyuki Matsuzawa, Boontarika Thunnakart, Ken Ozawa, Yuko Yamaguchi, Hiroyuki Nakano, Hiroichi Kawahira

Proceedings Volume 6153, 61531J (2006) https://doi.org/10.1117/12.651563

KEYWORDS: Silicon, Reflectivity, Oxides, Refractive index, Immersion lithography, Photoresist materials, Lithography, Optimization (mathematics), Polarization, Semiconductors

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Proceedings Article | 29 March 2006 Paper

Changes of chemical nature of photoresists induced by various plasma treatments and their impact on LWR

Hiroichi Kawahira, Nobuyuki Matsuzawa, Eriko Matsui, Atsuhiro Ando, Kazi M. A. Salam, Masashi Yoshida, Yuko Yamaguchi, Katsuhisa Kugimiya, Tetsuya Tatsumi, Hiroyuki Nakano, Takeshi Iwai, Makiko Irie

Proceedings Volume 6153, 615319 (2006) https://doi.org/10.1117/12.656002

KEYWORDS: Line width roughness, Photoresist materials, Etching, Plasma, Plasma treatment, Chemical analysis, FT-IR spectroscopy, Polymers, Lithography, Semiconducting wafers

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Proceedings Article | 12 May 2005 Paper

Novel robust optimization method of lithographic conditions for correlative multilayers beyond 65 nm node

Koichi Takeuchi, Ken Ozawa, Fumikatsu Uesawa, Hiroichi Kawahira

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600175

KEYWORDS: Lithography, Metals, Photomasks, SRAF, Optical proximity correction, Signal to noise ratio, Error analysis, Critical dimension metrology, Integrated circuits, Semiconducting wafers

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Proceedings Article | 12 May 2005 Paper

Robust lithography process control methodology anticipating CD after etching using scatterometry below 65nm node

Tokihisa Kaneguchi, Atsushi Someya, Hiroichi Kawahira

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.598574

KEYWORDS: Critical dimension metrology, Etching, Lithography, Scatterometry, Photomasks, Photoresist processing, Process control, Optical proximity correction, Semiconductors, Chemical elements

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Proceedings Article | 6 May 2005 Paper

BEOL process technology based on proximity electron lithography: demonstration of the via-chain yield comparable with ArF lithography

S. Nohdo, S. Omori, K. Iwase, M. Yoshizawa, T. Motohashi, K. Oguni, K. Nakayama, H. Egawa, T. Takeda, T. Morikawa, S. Nohama, H. Nakano, T. Kitagawa, S. Moriya, H. Kawahira

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601733

KEYWORDS: Photomasks, Lithography, Resistance, Semiconducting wafers, Inspection, Photoresist processing, Charged-particle lithography, Back end of line, Copper, Etching

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Proceedings Article | 28 May 2004 Paper

Lithography of choice for the 45 nm node: new medium, new wavelength, or new beam

Fumikatsu Uesawa, Mikio Katsumata, Kazuhisa Ogawa, Koichi Takeuchi, Shinji Omori, Masaki Yoshizawa, Hiroichi Kawahira

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535104

KEYWORDS: Lithography, Photomasks, Semiconducting wafers, Charged-particle lithography, Lithographic illumination, Phase shifts, Optical lithography, Electroluminescence, Photoresist processing, Critical dimension metrology

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Proceedings Article | 20 May 2004 Paper

First via-hole TEG fabricated by using 90-nm CMOS technology and proximity electron lithography: electric and lithographic results

Tetsuya Kitagawa, Masaki Yoshizawa, Kazuya Iwase, Shinji Omori, Shoji Nohama, Hiroyuki Nakano, Shigeru Moriya, Hiroichi Kawahira

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534423

KEYWORDS: Charged-particle lithography, Photomasks, Lithography, Scanners, Contamination, Semiconducting wafers, Overlay metrology, Photoresist processing, Resistance, Image processing

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Proceedings Article | 1 August 2002 Paper

Advanced pattern correction method for fabricating highly accurate reticles

Shunichiro Sato, Masaaki Koyama, Mikio Katsumata, Ichiro Kagami, Hiroichi Kawahira

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476964

KEYWORDS: Critical dimension metrology, Dry etching, Etching, Cadmium, Modulation, Optical proximity correction, Reticles, Photomasks, Electron beams, Logic

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Proceedings Article | 30 July 2002 Paper

Defect printability of alternating phase-shift mask: a critical comparison of simulation and experiment

Ken Ozawa, Tooru Komizo, Koji Kikuchi, Hidetoshi Ohnuma, Hiroichi Kawahira

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474479

KEYWORDS: Photomasks, Optical lithography, Chromium, Quartz, Critical dimension metrology, Fiber reinforced polymers, Phase shifts

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Proceedings Article | 12 July 2002 Paper

New method for reducing across-chip poly-CD variation with statistical OPC/gauge capability analysis

Hidetoshi Ohnuma, Koji Kikuchi, Hiroichi Kawahira

Proceedings Volume 4692, (2002) https://doi.org/10.1117/12.475672

KEYWORDS: Optical proximity correction, Statistical analysis, Microelectronics, Lithium, Picosecond phenomena, Optical calibration, Logic devices

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Proceedings Article | 11 March 2002 Paper

New method for reducing across chip poly-CD variation with statistical OPC/gauge capability analysis

Hidetoshi Ohnuma, Koji Kikuchi, Hiroichi Kawahira

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458311

KEYWORDS: Optical proximity correction, Critical dimension metrology, Statistical analysis, Lithography, Photomasks, Logic devices, Logic, Control systems, Optical calibration, Composites

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Proceedings Article | 5 September 2001 Paper

Focused ion beam repair for quartz bump defect of alternating phase-shift masks

Ichiro Kagami, Daichi Kakuta, Tooru Komizo, Hiroichi Kawahira

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438391

KEYWORDS: Quartz, Etching, Photomasks, Chromium, Software development, Ion beams, Atomic force microscopy, Visibility, Phase shifts, Lithography

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Proceedings Article | 5 September 2001 Paper

New mask data verification method after optical proximity effect correction

Kazuhisa Ogawa, Isao Ashida, Hiroichi Kawahira

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438340

KEYWORDS: Optical proximity correction, Optical calibration, Photomasks, Data processing, Data corrections, Lithography, Data compression, Optical simulations, Semiconductors, Algorithm development

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Proceedings Article | 5 September 2001 Paper

Optimization of fabrication process for dual-trench-type alternating PSM

Tooru Komizo, Ichiro Kagami, Daichi Kakuta, Hiroichi Kawahira

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438341

KEYWORDS: Etching, Quartz, Photomasks, Reactive ion etching, Photoresist processing, Chromium, Lithography, Phase shifts, Electron beam lithography, Process control

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Proceedings Article | 5 September 2001 Paper

New optimization method of exposure with alternative phase-shifting masks

Koji Kikuchi, Hidetoshi Ohnuma, Hiroichi Kawahira

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438397

KEYWORDS: Photomasks, Logic devices, Phase shifting, Phase shifts, Quartz, Mask making, Lithography, Optical proximity correction, Fabrication, Excimer lasers

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Proceedings Article | 22 January 2001 Paper

Effective data compaction algorithm for vector scan EB writing system

Shinichi Ueki, Isao Ashida, Hiroichi Kawahira

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410740

KEYWORDS: Algorithm development, Fiber reinforced polymers, Photomask technology, Electron beams, Data processing

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Proceedings Article | 22 January 2001 Paper

High-performance devices in the new century: optical lithography and mask strategy for 0.13-um SoC (Photomask Japan 2000 panel discussion review)

Hiroichi Kawahira, Vic Nagano

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410715

KEYWORDS: Photomasks, System on a chip, Lithography, Optical lithography, Optical proximity correction, Mask making, Printing, Critical dimension metrology, Chemical mechanical planarization, Semiconducting wafers

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Proceedings Article | 19 July 2000 Paper

Magnetic neutral loop discharge etching for 130-nm generation photomask fabrication

Mikio Katsumata, Hiroichi Kawahira

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392027

KEYWORDS: Etching, Critical dimension metrology, Photomasks, Chromium, Plasma, Magnetism, Plasma etching, Opacity, Dry etching, Chemically amplified resists

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Proceedings Article | 19 July 2000 Paper

Development of a fast linewidth correction system

Ryuji Takenouchi, Isao Ashida, Hiroichi Kawahira

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392081

KEYWORDS: Parallel processing, Logic, Optical proximity correction, Data processing, Space operations, Detection and tracking algorithms, Silicon, Integrated optics, Optical calibration

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Proceedings Article | 5 July 2000 Paper

Method of expanding process window for the double exposure technique with alt-PSMs

Koji Kikuchi, Hidetoshi Ohnuma, Hiroichi Kawahira

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.388947

KEYWORDS: Photomasks, Logic, Optical proximity correction, Binary data, Chromium, Phase shifting, Lithography, Mask making, Critical dimension metrology, Excimer lasers

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Proceedings Article | 30 December 1999 Paper

Fabrication process of Cr-based attenuated phase-shift masks for KrF excimer laser lithography

Ichiro Kagami, Kiichi Ishikawa, Daichi Kakuta, Hiroichi Kawahira

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373387

KEYWORDS: Carbon, Photomasks, Etching, Transmittance, Quartz, Phase shifts, Lithography, Opacity, Excimer lasers, Photoresist processing

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Proceedings Article | 30 December 1999 Paper

PMJ' 99 panel discussion review: OPC mask technology for KrF lithography

Hiroichi Kawahira, Naoya Hayashi, Hideaki Hamada

Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373327

KEYWORDS: Photomasks, Optical proximity correction, Inspection, Critical dimension metrology, Lithography, Defect inspection, Manufacturing, Mask making, Semiconducting wafers, Optics manufacturing

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Proceedings Article | 25 August 1999 Paper

New data processing of dummy pattern generation adaptive for CMP process

Shinichi Ueki, Isao Ashida, Hiroichi Kawahira

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360198

KEYWORDS: Chemical mechanical planarization, Data processing, Dielectrics, Raster graphics, Algorithm development, Photomasks, X-rays, Capacitance

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Proceedings Article | 25 August 1999 Paper

Proposal of new layout data format for LSI patterns

Isao Ashida, Yutaka Sato, Hiroichi Kawahira

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360192

KEYWORDS: Photomasks, Data processing, Data conversion, Data compression, Optical proximity correction, Optical calibration, Very large scale integration, Interfaces, Logic devices, Logic

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Proceedings Article | 25 August 1999 Paper

Comparison of mulitpass gray strategy and conventional writing method

Ichiro Kagami, Masaaki Koyama, Hiroichi Kawahira

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360205

KEYWORDS: Photoresist processing, Electron beams, Photomasks, Raster graphics, Modulation, Dry etching, Etching, Chromium, Laser scattering, Scattering

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Proceedings Article | 25 August 1999 Paper

Development of Cr-based attenuated phase-shift mask process for 0.18-um device generation

Ichiro Kagami, Kiichi Ishikawa, Daichi Kakuta, Hiroichi Kawahira

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360215

KEYWORDS: Photomasks, Etching, Quartz, Critical dimension metrology, Phase shifts, Semiconducting wafers, Dry etching, Lithography, Excimer lasers, Photoresist processing

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Proceedings Article | 18 December 1998 Paper

Issues on mask technologies: 0.18-um and beyond

Naoya Hayashi, Hiroichi Kawahira, Hideaki Hamada

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332841

KEYWORDS: Photomasks, Reticles, Defect inspection, Logic devices, Manufacturing, Mask making, Error analysis, Optical proximity correction, Printing, Logic

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Proceedings Article | 1 September 1998 Paper

Automatic alternative phase-shift mask CAD layout tool for gate shrinkage of embedded DRAM in logic below 0.18 um

Hidetoshi Ohnuma, Hiroichi Kawahira

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328802

KEYWORDS: Photomasks, Logic, Phase shifts, Computer aided design, Lithography, Binary data, Double patterning technology, Logic devices, Excimer lasers, Databases

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Proceedings Article | 28 July 1997 Paper

Fast chip-level OPC system on mask database

Hidetoshi Ohnuma, Keisuke Tsudaka, Hiroichi Kawahira

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277249

KEYWORDS: Optical proximity correction, Databases, Photomasks, Data corrections, Data processing, Logic, Raster graphics, Optical calibration, Process control, Printing

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Proceedings Article | 28 July 1997 Paper

Photomask fabrication feasibility for next-generation reticle format

Mikio Katsumata, Hiroichi Kawahira, Satoru Nozawa

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277253

KEYWORDS: Reticles, Photomasks, Dry etching, Critical dimension metrology, Chromium, Etching, Plasma, Optical lithography, Optical imaging, Imaging systems

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Proceedings Article | 27 December 1996 Paper

Chemically amplified resist process for 0.25-um-generation photomasks

Mikio Katsumata, Hiroichi Kawahira, Minoru Sugawara, Satoru Nozawa

Proceedings Volume 2884, (1996) https://doi.org/10.1117/12.262795

KEYWORDS: Reticles, Critical dimension metrology, Photoresist processing, Dry etching, Chromium, Photomasks, Optical proximity correction, Chemically amplified resists, Etching, Electron beams

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Proceedings Article | 27 December 1996 Paper

Review of defect round table at Photomask Japan '96

Hiroichi Kawahira, James Wiley

Proceedings Volume 2884, (1996) https://doi.org/10.1117/12.262839

KEYWORDS: Photomasks, Defect inspection, Optical proximity correction, Chromium, Wet etching, Mask making, Dry etching, Manufacturing, Inspection, Etching

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Proceedings Article | 24 July 1996 Paper

Manufacturing feasibility of OPC masks for 0.25-um rule devices

Hiroichi Kawahira, Mikio Katsumata, Keisuke Tsudaka, Akihiro Ogura, Manabu Tomita, Satoru Nozawa

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245218

KEYWORDS: Optical proximity correction, Photomasks, Defect inspection, Mask making, Photoresist processing, Optical lithography, Software development, Reticles, Manufacturing, Optics manufacturing

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Proceedings Article | 24 July 1996 Paper

Chemically amplified resist process for 0.25-um generation photomasks

Mikio Katsumata, Hiroichi Kawahira, Minoru Sugawara, Satoru Nozawa

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245249

KEYWORDS: Reticles, Critical dimension metrology, Dry etching, Photoresist processing, Chromium, Photomasks, Optical proximity correction, Chemically amplified resists, Electron beams, Optical calibration

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Proceedings Article | 7 June 1996 Paper

Influence of process latitude on exposure characteristics

Minoru Sugawara, Hiroichi Kawahira, Satoru Nozawa

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240932

KEYWORDS: Photomasks, Semiconducting wafers, Tolerancing, Lithography, Iterated function systems, Information operations, Radon, Toxic industrial chemicals, Mask making, Logic devices

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Proceedings Article | 8 December 1995 Paper

Attenuated phase-shifting mask specification with modified beam illumination

Ichiro Kagami, Minoru Sugawara, Hiroichi Kawahira, Keisuke Tsudaka, Kiichi Ishikawa, Satoru Nozawa

Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228198

KEYWORDS: Photomasks, Transmittance, Lithography, Photoresist processing, Lithographic illumination, Phase shifts, Convolution, Semiconducting wafers, Optical lithography, Mask making

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Proceedings Article | 8 December 1995 Paper

Fast EB-PEC system for 0.25-um device reticle fabrication using a variable shaped beam machine

Manabu Tomita, Hidetoshi Ohnuma, Masaaki Koyama, Hiroichi Kawahira

Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228209

KEYWORDS: Reticles, Data processing, Scattering, Parallel processing, Photomasks, Algorithm development, Data corrections, Optical proximity correction, Modulation

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Proceedings Article | 8 December 1995 Paper

Defect printability study of attenuated phase-shifting masks for specifying inspection sensitivity

Minoru Sugawara, Kiichi Ishikawa, Hiroichi Kawahira, Ichiro Kagami, Satoru Nozawa

Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228199

KEYWORDS: Photomasks, Semiconducting wafers, Transmittance, Phase shifts, Inspection, Defect inspection, Optical proximity correction, Mask making, Indium arsenide, Optical calibration

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Proceedings Article | 3 July 1995 Paper

SEMI standards programmed defect masks and their applications for defect inspection

Hiroichi Kawahira, Yoshiki Suzuki

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212807

KEYWORDS: Photomasks, Defect inspection, Computer aided design, Reticles, Inspection, Semiconducting wafers, Mask making, Nomenclature, Phase shifting, Process control

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Proceedings Article | 3 July 1995 Paper

EB proximity effect correction system for 0.25-um device reticle fabrication

Manabu Tomita, Hidetoshi Ohnuma, Masaaki Koyama, Hiroichi Kawahira

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212789

KEYWORDS: Reticles, Scattering, Data processing, Modulation, Parallel processing, Data corrections, Photomasks, Semiconducting wafers, Algorithm development

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Proceedings Article | 3 July 1995 Paper

Fast-resist image estimation methodology using light-intensity distribution

Keisuke Tsudaka, Manabu Tomita, Minoru Sugawara, Hiroichi Kawahira, Satoru Nozawa

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212804

KEYWORDS: Optical proximity correction, Image processing, Image analysis, Photoresist processing, Convolution, Photomasks, Lithography, Optical calibration, Error analysis, Semiconductors

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Proceedings Article | 26 May 1995 Paper

Practical evaluation of optical-proximity effect correction by EDM methodology

Minoru Sugawara, Hiroichi Kawahira, Keisuke Tsudaka, Satoru Nozawa

Proceedings Volume 2440, (1995) https://doi.org/10.1117/12.209253

KEYWORDS: Optical proximity correction, Photomasks, Image processing, Reticles, Semiconducting wafers, Lithography, Optical calibration, Opacity, Mask making, Optical lithography

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Proceedings Article | 22 May 1995 Paper

SEMI standards programmed defect masks and its application for defect inspection

Hiroichi Kawahira, Yoshiki Suzuki

Proceedings Volume 2439, (1995) https://doi.org/10.1117/12.209201

KEYWORDS: Photomasks, Defect inspection, Inspection, Computer aided design, Reticles, Mask making, Semiconducting wafers, Nomenclature, Phase shifting, Process control

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Proceedings Article | 3 November 1994 Paper

New mask optimization methodology using exposure-defocus and mask fabrication latitude

Keisuke Tsudaka, Minoru Sugawara, Hiroichi Kawahira, Akihiro Ogura, Satoru Nozawa

Proceedings Volume 2254, (1994) https://doi.org/10.1117/12.191933

KEYWORDS: Photomasks, Semiconducting wafers, X-ray technology, Lithium, Binary data, Mask making, Source mask optimization, Optical lithography, X-rays, Photoresist processing

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Proceedings Article | 3 November 1994 Paper

Development of practical attenuated phase-shifting mask

Akihiro Ogura, Hiroichi Kawahira, Minoru Sugawara, Keisuke Tsudaka, Takehiko Gunji, Satoru Nozawa

Proceedings Volume 2254, (1994) https://doi.org/10.1117/12.191939

KEYWORDS: Photomasks, Transmittance, Defect inspection, Phase shifts, Reactive ion etching, Optical simulations, X-ray technology, Excimer lasers, Laser engraving, Chromium

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Proceedings Article | 17 May 1994 Paper

Estimation of attenuated phase-shifting mask fabrication latitude using an optical exposure-defocus methodology

Minoru Sugawara, Hiroichi Kawahira, Keisuke Tsudaka, Akihiro Ogura, Satoru Nozawa, Fumikatsu Uesawa, Hideo Shimizu

Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175416

KEYWORDS: Photomasks, Transmittance, Mask making, Semiconducting wafers, Etching, Phase shifting, Error analysis, Chromium, Quartz, Phase shifts

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Proceedings Article | 8 August 1993 Paper

Exposure alignment compensation method for rim phase-shifting mask fabrication

Minoru Sugawara, Hiroichi Kawahira, Akihiro Ogura, Satoru Nozawa

Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150426

KEYWORDS: Image registration, Photomasks, Optical lithography, Mask making, Optical alignment, Phase shifting, Phase shifts, Destructive interference, Structural design, Optical simulations

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Showing 5 of 48 publications

Proceedings Volume Editor (5)

SPIE Conference Volume | 17 October 2008

Photomask Technology 2008

SPIE Conference Volume | 2 October 2007

Photomask Technology 2007

SPIE Conference Volume | 10 May 2007

Photomask and Next-Generation Lithography Mask Technology XIV

SPIE Conference Volume | 1 August 2002

Photomask and Next-Generation Lithography Mask Technology IX

SPIE Conference Volume | 5 September 2001

Photomask and Next-Generation Lithography Mask Technology VIII

Conference Committee Involvement (22)

Photomask Technology

7 October 2008 | Monterey, California, United States

Design for Manufacturability through Design-Process Integration II

28 February 2008 | San Jose, California, United States

Photomask Technology

18 September 2007 | Monterey, California, United States

SPIE Photomask Technology

17 September 2007 | Monterey, United States

Photomask and Next Generation Lithography Mask Technology XIV

17 April 2007 | Yokohama, Japan

Photomask and Next Generation Lithography Mask Technology XIV

17 April 2007 | Yokohama, Japan

Design for Manufacturability through Design-Process Integration

1 March 2007 | San Jose, California, United States

Emerging Lithographic Technologies XI

27 February 2007 | San Jose, California, United States

Photomask and Next-Generation Lithography Mask Technology XIII

18 April 2006 | Yokohama, Japan

Design and Process Integration for Microelectronic Manufacturing IV

23 February 2006 | San Jose, California, United States

Emerging Lithographic Technologies X

21 February 2006 | San Jose, California, United States

Photomask and Next-Generation Lithography Mask Technology XII

13 April 2005 | Yokohama, Japan

Design and Process Integration for Microelectronic Manufacturing IV

3 March 2005 | San Jose, California, United States

Emerging Lithographic Technologies IX

1 March 2005 | San Jose, California, United States

Photomask and Next-Generation Lithography Mask Technology XI

14 April 2004 | Yokohama, Japan

Design and Process Integration for Microelectronic Manufacturing III

26 February 2004 | Santa Clara, California, United States

Photomask and NGL Mask Technology X

16 April 2003 | Yokohama, Japan

Design and Process Integration for Microelectronic Manufacturing II

27 February 2003 | Santa Clara, CA, United States

Photomask Technology

1 October 2002 | Monterey, CA, United States

Photomask and NGL Mask Technology IX

23 April 2002 | Yokohama, Japan

Design and Process Integration for Microelectronics Manufacturing

6 March 2002 | Santa Clara, CA, United States

Photomask and NGL Mask Technology VIII

25 April 2001 | Kanagawa, Japan

Showing 5 of 22 Conference Committees

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