Mr. Jun Irisawa
Senior Researcher at Asahi Glass Co Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Transparency, Etching, Chemical species, Dry etching, Polymers, Resistance, Plasma etching, Fluorine, Absorption

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Refractive index, Chemical species, Metals, Germanium, Electrons, Silicon, Absorbance, Fluorine, Liquids, Absorption

PROCEEDINGS ARTICLE | June 12, 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Transparency, Etching, Chemical species, Polymers, Gases, Resistance, Fluorine, Semiconducting wafers, Absorption

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