Lev Faivishevsky
at Applied Materials
SPIE Involvement:
Publications (5)

Proceedings Article | 28 October 2009 Paper
Ziv Parizat, Jo Finders, Marcel Demarteau, Onno Wissmans, Ingrid Minaert Janssen, Frank Duray, Michael Ben Yishai, Shmoolik Mangan, Yaron Cohen, Yair Elblinger, Lev Faivishevsky, Netanel Polonsky, Tal Verdene, Ilan Englard
Proceedings Volume 7488, 74881P (2009) https://doi.org/10.1117/12.833467
KEYWORDS: Photomasks, Scanners, Critical dimension metrology, Semiconducting wafers, Reticles, Scanning electron microscopy, Airborne remote sensing, Calibration, Acquisition tracking and pointing, Metrology

Proceedings Article | 7 October 2009 Paper
Lev Faivishevsky, Sergey Khristo, Ishai Schwarzband, Shmoolik Mangan
Proceedings Volume 7488, 74882U (2009) https://doi.org/10.1117/12.829635
KEYWORDS: Inspection, Photomasks, Calibration, Image processing, Data modeling, Scanners, Process modeling, Airborne remote sensing, Optical lithography, Databases

Proceedings Article | 30 September 2009 Paper
Jun Kim, Wei-Guo Lei, Joan McCall, Suheil Zaatri, Michael Penn, Rajesh Nagpal, Lev Faivishevsky, Michael Ben-Yishai, Udy Danino, Aviram Tam, Oded Dassa, Vivek Balasubramanian, Tejas Shah, Mark Wagner, Shmoolik Mangan
Proceedings Volume 7488, 748808 (2009) https://doi.org/10.1117/12.829637
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Defect detection, Data modeling, Wafer-level optics, Airborne remote sensing, Transform theory, Detection and tracking algorithms, Scanners

Proceedings Article | 24 March 2009 Paper
Proceedings Volume 7272, 727229 (2009) https://doi.org/10.1117/12.814282
KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Critical dimension metrology, Inspection, Airborne remote sensing, Image acquisition, Resolution enhancement technologies, Manufacturing, Phase shifting

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 71223C (2008) https://doi.org/10.1117/12.801434
KEYWORDS: Edge detection, Inspection, Photomasks, Scanning electron microscopy, Critical dimension metrology, Databases, Optical imaging, Sensors, Microscopy, Image processing

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