Dr. Steve Wittekoek
SPIE Involvement:
Publications (7)

Proceedings Article | 17 May 1994 Paper
Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175435
KEYWORDS: Photoresist materials, Nanoimprint lithography, Reticles, Photoresist processing, Semiconducting wafers, Image processing, Lithography, Photoresist developing, Optical lithography, Image quality

Proceedings Article | 8 August 1993 Paper
Stefan Wittekoek, Martin van den Brink, G. Poppelaars, Marijan Reuhman-Huisken, A. Grassman, U. Boettinger
Proceedings Volume 1927, (1993) https://doi.org/10.1117/12.150454
KEYWORDS: Deep ultraviolet, Semiconducting wafers, Optical alignment, Optical lithography, Lithography, Image quality, Data transmission, Excimer lasers, Control systems, Wafer-level optics

Proceedings Article | 1 June 1992 Paper
Barton Katz, James Greeneich, Richard Rogoff, Steve Slonaker, Stefan Wittekoek, Paul Luehrmann, Martin van den Brink, Douglas Ritchie
Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130363
KEYWORDS: Lithography, Optical alignment, Phase shifts, Overlay metrology, Reticles, Metals, Silicon, Deep ultraviolet, Semiconducting wafers, Optical lithography

Proceedings Article | 1 June 1992 Paper
Rainer Pforr, Stefan Wittekoek, Roland Van Den Bosch, Luc Van den Hove, Rik Jonckheere, Theo Fahner, Rolf Seltmann
Proceedings Volume 1674, (1992) https://doi.org/10.1117/12.130355
KEYWORDS: Optical alignment, Semiconducting wafers, Diffraction gratings, Image quality, Information operations, Diffraction, Refractive index, Oxides, Overlay metrology, Silicon

Proceedings Article | 1 July 1991 Paper
Martin van den Brink, Barton Katz, Stefan Wittekoek
Proceedings Volume 1463, (1991) https://doi.org/10.1117/12.44826
KEYWORDS: Semiconducting wafers, Sensors, Optical alignment, Optical lithography, Interferometers, Wafer-level optics, Particles, Lenses, Overlay metrology, Metrology

Showing 5 of 7 publications
Proceedings Volume Editor (2)

Conference Committee Involvement (2)
Optical Microlithography and Metrology for Microcircuit Fabrication
24 April 1989 | Paris, France
Optical Microlithographic Technology for Integrated Circuit Fabrication and Inspection
30 March 1987 | The Hague, Netherlands
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