Dr. Rik Jonckheere
Reticle Manager at IMEC
SPIE Involvement:
Conference Program Committee | Author
Publications (79)

PROCEEDINGS ARTICLE | June 12, 2018
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Visualization, Inspection, Atomic force microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical alignment, Semiconducting wafers, Tolerancing

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Wafer-level optics, Multilayers, Image processing, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical alignment, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Manufacturing, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Carbon, Etching, Scanners, Particles, Silicon, Manufacturing, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, 193nm lithography

PROCEEDINGS ARTICLE | September 4, 2015
Proc. SPIE. 9661, 31st European Mask and Lithography Conference
KEYWORDS: Reticles, Deep ultraviolet, Reflection, Scanners, Coating, Reflectivity, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Mirrors, Defect detection, Scanners, Inspection, Atomic force microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 79 publications
Conference Committee Involvement (9)
Photomask Technology 2015
29 September 2015 | Monterey, California, United States
Photomask Technology 2014
16 September 2014 | Monterey, California, United States
SPIE Photomask Technology
10 September 2013 | Monterey, California, United States
Photomask Technology
11 September 2012 | Monterey, California, United States
Photomask Technology
19 September 2011 | Monterey, California, United States
Showing 5 of 9 published special sections
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