Mr. Taiki Kimura
at Toshiba Corp
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Convolutional neural networks, Neural networks, Semiconductor manufacturing

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Convolutional neural networks, Data modeling, Image processing, Feature extraction, Neural networks, Design for manufacturing, Photomasks, Optical proximity correction, Convolution, Critical dimension metrology, Semiconducting wafers, Computer architecture, Performance modeling

PROCEEDINGS ARTICLE | March 26, 2015
Proc. SPIE. 9426, Optical Microlithography XXVIII
KEYWORDS: Wafer-level optics, Lithography, Lithographic illumination, Etching, Image processing, Scanning electron microscopy, Optical simulations, Immersion lithography, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Etching, 3D modeling, Photomasks, Source mask optimization, Nanoimprint lithography, Reactive ion etching, Photoresist processing, Semiconducting wafers, 3D image processing

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