CONFERENCE PROCEEDINGS
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Wei-Hung Wang
at Macronix International Co., Ltd.
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Author
Publications (4)
Proceedings Article | 10 April 2024 Poster + Paper
Overlay control improvements through dynamic sampling
Onur Demirer, Robin Maximilian Zech, Chao-Jen Tsou, W. Wang, C. Huang, Elvis Yang, Afu Chiu, Alexander Muehle, Holger Bald, Clemens Utzny, Scott Eitapence, Boris Habets, Norman Birnstein
Proceedings Volume 12955, 1295527 (2024) https://doi.org/10.1117/12.3009830
KEYWORDS: Semiconducting wafers, Overlay metrology, Control systems, Simulations, Scanners, Metrology, Lithography, Advanced process control, High volume manufacturing
Proceedings Article | 28 April 2023 Poster + Paper
Development of novel focus spot detection methods for high-volume manufacturing
Syed Naime Mohammad, Chao-Jen Tsou, Afu Chiu, Norman Birnstein, Erick deGouw, Clemens Utzny, Philip Groeger, Stefan Buhl, W. Wang, C. Huang, Elvis Yang, T. Yang, K. Chen
Proceedings Volume 12494, 1249415 (2023) https://doi.org/10.1117/12.2657965
KEYWORDS: Semiconducting wafers, Scanners, Contamination, High volume manufacturing, Particles, Neodymium, Tunable filters, Defense systems, Sensors, Image enhancement
Proceedings Article | 26 May 2022 Poster + Paper
Exposure process optimization using machine learning overlay prediction
Masahiro Yoshida, W. H. Wang, C. H. Huang, Elvis Yang, T. H. Yang, K. C. Chen, Yosuke Takarada, Yoshiki Sakamoto, Shin-ichi Egashira, Ken Otani, Tsukasa Saito, Shoshi Katayama, Seiya Miura, Douglas Shelton
Proceedings Volume 12053, 120531L (2022) https://doi.org/10.1117/12.2611020
KEYWORDS: Data modeling, Semiconducting wafers, Overlay metrology, Machine learning, 3D modeling, Lithography, Data acquisition, Wafer testing, Target detection, Process modeling
Proceedings Article | 26 May 2022 Poster + Paper
Machine learning modeling using process context and exposure data for overlay prediction
W. H. Wang, Irina Brinster, Mohsen Maniat, Fatima Anis, Yen-Hui Lee, Sven Boese, C. F. Tseng, Wei-Yuan Chu, Boris Habets, C. H. Huang, Elvis Yang, T. H. Yang, K. C. Chen
Proceedings Volume 12053, 120531Q (2022) https://doi.org/10.1117/12.2613202
KEYWORDS: Semiconducting wafers, Overlay metrology, Data modeling, Metrology, Optical parametric oscillators, Performance modeling, Process modeling, Machine learning, Semiconductor manufacturing, Data processing
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