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Yen-Hui Lee
at KLA Taiwan
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Publications (1)
Proceedings Article | 26 May 2022 Poster + Paper
Machine learning modeling using process context and exposure data for overlay prediction
W. H. Wang, Irina Brinster, Mohsen Maniat, Fatima Anis, Yen-Hui Lee, Sven Boese, C. F. Tseng, Wei-Yuan Chu, Boris Habets, C. H. Huang, Elvis Yang, T. H. Yang, K. C. Chen
Proceedings Volume 12053, 120531Q (2022) https://doi.org/10.1117/12.2613202
KEYWORDS: Semiconducting wafers, Overlay metrology, Data modeling, Metrology, Optical parametric oscillators, Performance modeling, Process modeling, Machine learning, Semiconductor manufacturing, Data processing
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