Prof. Younghun Yu Profile

Prof. Younghun Yu

Professor at Jeju National Univ

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Author

Publications (6)

SPIE Journal Paper | 1 February 2011

Twin-image elimination using quadrantal masks in a digital holographic microscope

Moonseok Kim, Sukjoon Hong, Seongbo Shim, Kwangsup Soh, Younghun Yu, Sanghoon Shin, Jaewan Kim, Jaisoon Kim

OE, Vol. 50, Issue 02, 025801, (February 2011) https://doi.org/10.1117/12.10.1117/1.3537970

KEYWORDS: Charge-coupled devices, Molybdenum, Digital holography, Holography, Holograms, Microscopes, 3D image reconstruction, 3D metrology, Optical engineering, 3D image processing

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Proceedings Article | 16 October 2007 Paper

Real-time elimination of twin images in digital holographic microscope

Hyungjun Cho, Doocheol Kim, Younghun Yu, Sanghoon Shin, Wongun Jang, Jung-Young Son

Proceedings Volume 6778, 677808 (2007) https://doi.org/10.1117/12.748211

KEYWORDS: Holograms, Digital holography, Holography, Microscopes, 3D image reconstruction, Charge-coupled devices, Objectives, Digital recording, Diffraction, CCD cameras

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Proceedings Article | 28 July 1997 Paper

CD variation sources of photomask

Byung Kim, Seong-Woon Choi, Yong Yu, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277271

KEYWORDS: Critical dimension metrology, Photomasks, Error analysis, Polymers, Sputter deposition, Quartz, Scattering, Semiconducting wafers, Analytical research, Statistical methods

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Proceedings Article | 7 July 1997 Paper

Pattern deformation induced from intensity-unbalanced off-axis illumination

Jin-Ha Kim, Seok-Hwan Oh, Dong-Seon Lee, Jeong-Ho Yeo, Yong Yu, Jeong-Lim Nam

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275980

KEYWORDS: Image quality, Diffraction, Semiconducting wafers

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Proceedings Article | 12 February 1997 Paper

Current status of mask CD uniformity as related to e-beam system

Sung-Chul Lim, Byung Kim, Seong-Woon Choi, Kyung Lee, Hyun Cho, Yong Yu, Hanku Cho, Jung-Min Sohn

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301202

KEYWORDS: Critical dimension metrology, Photomasks, Optical lithography, Raster graphics, Error analysis, Manufacturing, Semiconducting wafers, X-ray lithography, Cadmium, Printing

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Proceedings Article | 12 February 1997 Paper

Evaluation of process capabilities for 50 keV with rectangular-shaped beam using computer simulation

Byung-Cheol Cha, Yoo-Hyon Kim, Seong-Woon Choi, Yong Yu, Jung-Min Sohn

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301198

KEYWORDS: Beam shaping, Monte Carlo methods, Photoresist processing, Photomasks, Electron beam lithography, Computer simulations, Optical simulations, Algorithm development, Scattering, Lithography

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Showing 5 of 6 publications

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