Dr. Josep Nicolas
at SLAC National Accelerator Lab
SPIE Involvement:
Conference Program Committee | Author
Publications (23)

PROCEEDINGS ARTICLE | June 14, 2017
Proc. SPIE. 10237, Advances in X-ray Free-Electron Lasers Instrumentation IV
KEYWORDS: Light sources, X-ray optics, Femtosecond phenomena, Scattering, Crystals, X-rays, Light scattering, Dynamic light scattering, Picosecond phenomena, Hard x-rays, Free electron lasers

PROCEEDINGS ARTICLE | October 27, 2016
Proc. SPIE. 9965, Adaptive X-Ray Optics IV
KEYWORDS: Actuators, Mirrors, Light sources, X-ray optics, Metrology, Mechanics, Spatial frequencies, X-rays, Spatial resolution, Prototyping

PROCEEDINGS ARTICLE | October 27, 2016
Proc. SPIE. 9965, Adaptive X-Ray Optics IV
KEYWORDS: Actuators, Mirrors, X-rays, Thermal effects, Computer aided design, Grazing incidence, Hard x-rays, Free electron lasers, Stanford Linear Collider, Liquid crystal lasers

PROCEEDINGS ARTICLE | September 8, 2016
Proc. SPIE. 9962, Advances in Metrology for X-Ray and EUV Optics VI
KEYWORDS: Optical components, Mirrors, Optical design, Mechanics, Diagnostics, Ray tracing, Spectral resolution, Optical alignment, Tolerancing, Optics manufacturing

PROCEEDINGS ARTICLE | September 8, 2016
Proc. SPIE. 9962, Advances in Metrology for X-Ray and EUV Optics VI
KEYWORDS: Mirrors, X-ray optics, Nano opto mechanical systems, Denoising, Data acquisition, Time metrology, Autocollimators, Synchrotrons, Motion measurement, Laser beam diagnostics

PROCEEDINGS ARTICLE | September 30, 2013
Proc. SPIE. 8833, Tribute to H. John Caulfield
KEYWORDS: Optical filters, Optical signal processing, Fourier transforms, Oxygen, Spatial light modulators, LCDs, Optical correlators, 3D image processing, RGB color model, Diffraction gratings

Showing 5 of 23 publications
Conference Committee Involvement (3)
Advances in Metrology for X-Ray and EUV Optics VII
6 August 2017 | San Diego, California, United States
Advances in Metrology for X-Ray and EUV Optics VI
29 August 2016 | San Diego, California, United States
Advances in Metrology for X-Ray and EUV Optics V
18 August 2014 | San Diego, California, United States
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