Dr. Keun-Taek Park
at Advanced Mask Technology Ctr
SPIE Involvement:
Publications (4)

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 634913 (2006) https://doi.org/10.1117/12.685983
KEYWORDS: Photomasks, Diffraction, Polarization, Etching, Lithography, Semiconducting wafers, Lithographic illumination, Printing, Phase shifts, Electroluminescence

Proceedings Article | 28 June 2005 Paper
Charles Howard, Keun-Taek Park, Marcus Scherer, Svetomir Stankovic, Rusty Cantrell, Mark Herrmann
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617357
KEYWORDS: Monte Carlo methods, Photomasks, Error analysis, Deep ultraviolet, Printing, Overlay metrology, Phase shifts, Lithography, Optical alignment, Neodymium

Proceedings Article | 28 June 2005 Paper
Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617205
KEYWORDS: Etching, Photomasks, Quartz, Dry etching, Critical dimension metrology, Manufacturing, Semiconducting wafers, Resolution enhancement technologies, Phase shifts, Lithography

Proceedings Article | 12 May 2005 Paper
J. Heumann, J. Schramm, A. Birnstein, K. Park, T. Witte, N. Morgana, M. Hennig, R. Pforr, J. Thiele, N. Schmidt, C. Aquino
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601568
KEYWORDS: Photomasks, Quartz, Semiconducting wafers, Inspection, Bridges, Defect inspection, Resolution enhancement technologies, Scanning electron microscopy, Critical dimension metrology, Manufacturing

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