Dr. Keun-Taek Park Profile

Dr. Keun-Taek Park

at Advanced Mask Technology Ctr

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Author

Publications (4)

PROCEEDINGS ARTICLE | October 20, 2006

Image degradation due to phase effects in chromeless phase lithography

Proc. SPIE. 6349, Photomask Technology 2006

KEYWORDS: Lithography, Diffraction, Lithographic illumination, Polarization, Etching, Electroluminescence, Printing, Photomasks, Semiconducting wafers, Phase shifts

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PROCEEDINGS ARTICLE | June 28, 2005

Simulation of quartz phase etch affect on performance of ArF chrome-less hard shifter for 65-nm technology

Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII

KEYWORDS: Lithography, Etching, Quartz, Dry etching, Manufacturing, Photomasks, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

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PROCEEDINGS ARTICLE | June 28, 2005

Second level printing of advanced phase shift masks using DUV laser lithography

Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII

KEYWORDS: Lithography, Deep ultraviolet, Error analysis, Printing, Monte Carlo methods, Photomasks, Optical alignment, Neodymium, Overlay metrology, Phase shifts

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PROCEEDINGS ARTICLE | May 12, 2004

Defect printability and inspectability of Cr-less phase-shift masks for the 70nm node

Proc. SPIE. 5754, Optical Microlithography XVIII

KEYWORDS: Quartz, Manufacturing, Inspection, Scanning electron microscopy, Bridges, Photomasks, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Defect inspection

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