Dr. Keun-Taek Park
at Advanced Mask Technology Ctr
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Diffraction, Lithographic illumination, Polarization, Etching, Electroluminescence, Printing, Photomasks, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Etching, Quartz, Dry etching, Manufacturing, Photomasks, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Lithography, Deep ultraviolet, Error analysis, Printing, Monte Carlo methods, Photomasks, Optical alignment, Neodymium, Overlay metrology, Phase shifts

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Quartz, Manufacturing, Inspection, Scanning electron microscopy, Bridges, Photomasks, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Defect inspection

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