Dr. Keun-Taek Park Profile

Dr. Keun-Taek Park

at Advanced Mask Technology Ctr

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 20 October 2006 Paper

Image degradation due to phase effects in chromeless phase lithography

Jens Reichelt, K. Park, Rainer Pforr, Ralf Neubauer, Martin Sczyrba, Karsten Bubke, Ralf Ziebold

Proceedings Volume 6349, 634913 (2006) https://doi.org/10.1117/12.685983

KEYWORDS: Photomasks, Diffraction, Polarization, Etching, Lithography, Semiconducting wafers, Lithographic illumination, Printing, Phase shifts, Electroluminescence

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Proceedings Article | 28 June 2005 Paper

Second level printing of advanced phase shift masks using DUV laser lithography

Marcus Scherer, Mark Herrmann, Keun-Taek Park, Charles Howard, Rusty Cantrell, Svetomir Stankovic

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617357

KEYWORDS: Monte Carlo methods, Photomasks, Error analysis, Deep ultraviolet, Printing, Overlay metrology, Phase shifts, Lithography, Optical alignment, Neodymium

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Proceedings Article | 28 June 2005 Paper

Simulation of quartz phase etch affect on performance of ArF chrome-less hard shifter for 65-nm technology

Karsten Bubke, K. Park, Rainer Pforr, Martin Sczyrba

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617205

KEYWORDS: Etching, Photomasks, Quartz, Dry etching, Critical dimension metrology, Manufacturing, Semiconducting wafers, Resolution enhancement technologies, Phase shifts, Lithography

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Proceedings Article | 12 May 2005 Paper

Defect printability and inspectability of Cr-less phase-shift masks for the 70nm node

J. Thiele, A. Birnstein, T. Witte, N. Schmidt, J. Heumann, C. Aquino, M. Hennig, K. Park, N. Morgana, J. Schramm, R. Pforr

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.601568

KEYWORDS: Photomasks, Quartz, Semiconducting wafers, Inspection, Bridges, Defect inspection, Resolution enhancement technologies, Scanning electron microscopy, Critical dimension metrology, Manufacturing

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