Dr. Ralf Ziebold
at Qimonda Dresden GmbH & Co OHG
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Diffraction, Lithographic illumination, Polarization, Etching, Electroluminescence, Printing, Photomasks, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Optical lithography, Photomasks, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Diffractive optical elements, Data modeling, Calibration, Diffusion, Computer simulations, 3D modeling, Photomasks, Optimization (mathematics), Semiconducting wafers

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Diffraction, Polarization, Reflection, Manufacturing, Photomasks, Immersion lithography, Semiconducting wafers, Binary data, Phase shifts, Diffraction gratings

PROCEEDINGS ARTICLE | December 17, 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Data modeling, Manufacturing, Scanning electron microscopy, Printing, Data processing, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top