Michael D. Shumway
at Intel Corp
SPIE Involvement:
Publications (5)

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 63490V (2006) https://doi.org/10.1117/12.686566
KEYWORDS: Vestigial sideband modulation, Beam shaping, Photomasks, Manufacturing, Data modeling, Optical proximity correction, Optical lithography, Model-based design, Manufacturing equipment

Proceedings Article | 20 May 2004 Paper
Michael Shumway, Eric Snow, Kenneth Goldberg, Patrick Naulleau, Heidi Cao, Manish Chandhok, James Liddle, Erik Anderson, Jeffrey Bokor
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535666
KEYWORDS: Semiconducting wafers, Extreme ultraviolet, Gold, Photomasks, Spatial filters, Line edge roughness, Printing, Wafer-level optics, Extreme ultraviolet lithography, Spatial frequencies

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536021
KEYWORDS: Line width roughness, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Absorbance, Optical lithography, Lithography, Line edge roughness, Polymers, Manufacturing

Proceedings Article | 16 June 2003 Paper
Michael Shumway, Patrick Naulleau, Kenneth Goldberg, Eric Snow, Jeffrey Bokor
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484677
KEYWORDS: Extreme ultraviolet, Spatial frequencies, Line edge roughness, Interferometry, Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Diffraction gratings, Wafer-level optics, Diffraction

Proceedings Article | 20 August 2001 Paper
Michael Shumway, Sang Hun Lee, Chang Cho, Patrick Naulleau, Kenneth Goldberg, Jeffrey Bokor
Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436690
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Polymethylmethacrylate, Printing, Spatial frequencies, Mirrors, Computer simulations, Objectives, Optical design

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