Mr. Thomas Struck
Director, Materials Management at Infineon Technologies AG
SPIE Involvement:
Author
Publications (14)

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Reticles, Logic, Manufacturing, Photomasks, Optical alignment, Computer aided design, Semiconducting wafers, Product engineering, Prototyping, Standards development

PROCEEDINGS ARTICLE | May 28, 2003
Proc. SPIE. 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Reticles, Metrology, Deep ultraviolet, Cameras, Inspection, Objectives, Photomasks, Critical dimension metrology, Environmental sensing, Binary data

PROCEEDINGS ARTICLE | August 16, 2002
Proc. SPIE. 4764, 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Electrodes, Ions, Silicon, Manufacturing, Distortion, Ion beams, Photomasks, Semiconducting wafers, Projection lithography, Wafer bonding

PROCEEDINGS ARTICLE | August 20, 2001
Proc. SPIE. 4343, Emerging Lithographic Technologies V
KEYWORDS: Carbon, Optical lithography, Etching, Ions, Ion beams, Photomasks, Boron, Semiconducting wafers, Projection lithography, Beam controllers

PROCEEDINGS ARTICLE | April 9, 2001
Proc. SPIE. 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Oxides, Carbon, Lithography, Ions, Ion beams, Photomasks, Ion implantation, Deposition processes, Semiconducting wafers, Beam controllers

PROCEEDINGS ARTICLE | January 22, 2001
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Photodynamic therapy, Electrodes, Ions, Silicon, Doping, Distortion, Photomasks, Boron, Semiconducting wafers, Projection lithography

Showing 5 of 14 publications
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