Dr. Abhishek Vikram
Director, Product Marketing at ASML US
SPIE Involvement:
Area of Expertise:
Lithography , Wafer inspection , DFM , OPC Verification , Yield management , Metrology
Profile Summary

Dr. Abhishek Vikram, FIE, FIETE has worked over 22 years in the area of application of advanced semiconductor process control technologies. This involved development of methods for design inspection, OPC verification and wafer defect detection strategies in advanced technology nodes. He has worked in different engineering and team management roles at GlobalFoundries Fab8 NY, Anchor Semiconductor Santa Clara CA and KLA Corp. Currently he is working at ASML US as Director of Product Management and is responsible for eBeam inspection and computing application products for worldwide customers. Abhishek has completed PhD in Electrical Engineering from National Institute of Technology, Allahabad, India and MBA from Cornell University, Ithaca, USA
Publications (13)

Proceedings Article | 26 May 2022 Presentation + Paper
Peng Wu, Qi Zhu, Jihong Yang, Changjie Sun, Yiming Zhu, Abhishek Vikram, Ye Chen, Guojie Cheng, Hui Wang, Qing Zhang, Wenkui Liao
Proceedings Volume 12052, 1205213 (2022) https://doi.org/10.1117/12.2613403
KEYWORDS: Image processing, Scanning electron microscopy, Semiconducting wafers, Image analysis, Image classification, Machine learning, Image enhancement, Optical lithography

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11614, 1161406 (2021) https://doi.org/10.1117/12.2583454
KEYWORDS: Scanning electron microscopy, Wafer inspection, Machine learning, Semiconducting wafers, Databases, Defect detection, Wafer-level optics, Image processing, Semiconductor manufacturing, Optical proximity correction

Proceedings Article | 23 March 2020 Paper
Lijun Chen, Jun Zhu, Xuedong Fan, Haichang Zheng, Xiaolong Wang, Yancong Ge, Yu Zhang, Abhishek Vikram, Guojie Cheng, Hui Wang, Qing Zhang, Wenkui Liao
Proceedings Volume 11328, 113280Z (2020) https://doi.org/10.1117/12.2548377
KEYWORDS: Monochromatic aberrations, Optical lithography, Semiconducting wafers, Scanning electron microscopy, Image processing, Image resolution, Lithography, Computational lithography, Critical dimension metrology, Semiconductors

Proceedings Article | 20 March 2019 Paper
Proceedings Volume 10962, 1096217 (2019) https://doi.org/10.1117/12.2524569
KEYWORDS: Metrology, Semiconducting wafers, Image processing, Metals, 3D metrology, Atomic force microscopy, Chemical mechanical planarization, 3D image processing, Wafer bonding, Data processing

Proceedings Article | 20 March 2019 Paper
Proceedings Volume 10962, 109620L (2019) https://doi.org/10.1117/12.2511672
KEYWORDS: Scanning electron microscopy, Semiconducting wafers, Optical lithography, Defect detection, Etching, Process control, Image processing, Process engineering, Wafer inspection, Chemical mechanical planarization

Showing 5 of 13 publications
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