Gaston Lee
Section Manager at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Area of Expertise:
Photomask , Lithography
Publications (7)

PROCEEDINGS ARTICLE | May 10, 2016
Proc. SPIE. 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Modeling, Lithography, Metrology, Atomic force microscopy, Scanning electron microscopy, Transmission electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Phase shifts

PROCEEDINGS ARTICLE | September 25, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Quartz, Particles, Nitrogen, Atomic force microscopy, Personal digital assistants, Photomasks, SRAF, Binary data, Mask cleaning, Liquids

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Data modeling, Image processing, Photomasks, Double patterning technology, Critical dimension metrology, Forward error correction, Acoustics, Photoresist processing, Standards development

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Visualization, Scattering, Manufacturing, Laser applications, Inspection, Laser scattering, Photomasks, Double patterning technology, Optical proximity correction

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Reticles, Etching, Manufacturing, Chromium, Control systems, Photomasks, Forward error correction, Photoresist processing, Semiconducting wafers, Standards development

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Diffractive optical elements, Deep ultraviolet, Particles, Manufacturing, Control systems, Photomasks, Photoresist processing, Semiconducting wafers, Standards development

Showing 5 of 7 publications
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