Gaston Lee
Technical Manager at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Area of Expertise:
Photomask , Lithography
Publications (7)

Proceedings Article | 10 May 2016 Paper
Hsuan-Chen Chen, Ren-Hao Lin, Chien-Cheng Chen, Cheng-Hsuan Huang, Ta-Cheng Lien, Chia-Jen Chen, Gaston Lee, Hsin-Chang Lee, Anthony Yen
Proceedings Volume 9984, 998408 (2016)
KEYWORDS: Photomasks, Transmission electron microscopy, Atomic force microscopy, Critical dimension metrology, Scanning electron microscopy, Semiconducting wafers, Lithography, Metrology, Modeling, Phase shifts

Proceedings Article | 25 September 2010 Paper
C. L. Lu, C. H. Yu, W. H. Liu, Luke Hsu, Angus Chin, S. C. Lee, Anthony Yen, Gaston Lee, Peter Dress, Sherjang Singh, Uwe Dietze
Proceedings Volume 7823, 782325 (2010)
KEYWORDS: Binary data, Particles, Photomasks, SRAF, Nitrogen, Personal digital assistants, Liquids, Quartz, Mask cleaning, Atomic force microscopy

Proceedings Article | 23 September 2009 Paper
Gaston Lee, Peter Dress, Ssuwei Chen, Uwe Dietze
Proceedings Volume 7488, 74880K (2009)
KEYWORDS: Critical dimension metrology, Photoresist processing, Acoustics, Photomasks, Forward error correction, Lithography, Standards development, Image processing, Double patterning technology, Data modeling

Proceedings Article | 20 May 2006 Paper
Gaston Lee, Yi-Sheng Chung, Wei-Tsung Yang, Wen-Hwa Cheng, Ren-Jang Lin, Tsung Si Wang, Yuan-Cheng Cheng, Wei-Jen Chou
Proceedings Volume 6283, 62831H (2006)
KEYWORDS: Optical proximity correction, Double patterning technology, Inspection, Lithography, Photomasks, Visualization, Scattering, Laser applications, Manufacturing, Laser scattering

Proceedings Article | 28 June 2005 Paper
Proceedings Volume 5853, (2005)
KEYWORDS: Photomasks, Semiconducting wafers, Forward error correction, Reticles, Manufacturing, Chromium, Control systems, Standards development, Etching, Photoresist processing

Showing 5 of 7 publications
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