Dr. Hsu-Ting Huang
Manager at Taiwan Semiconductor Manufacturing Co Ltd
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Diffraction, Scattering, Calibration, Inspection, 3D modeling, 3D metrology, Wafer inspection, Photomasks, Semiconducting wafers, 3D image processing

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Semiconductors, Lithography, Calibration, Metals, Ultraviolet radiation, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Calibration, Metals, Ultraviolet radiation, Finite element methods, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Back end of line

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Optical lithography, Data modeling, Image processing, Electroluminescence, 3D modeling, Photomasks, Source mask optimization, Nanoimprint lithography, Semiconducting wafers, Standards development

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Optical lithography, Scattering, Calibration, 3D modeling, 3D metrology, Photomasks, Optical proximity correction, Semiconducting wafers, 3D image processing

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Data modeling, Calibration, 3D modeling, Photomasks, Source mask optimization, Optical proximity correction, Nanoimprint lithography, Contrast sensitivity, Optimization (mathematics), Semiconducting wafers

Showing 5 of 13 publications
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