Dr. Kazuaki Suzuki
Excutive Staff at Nikon Corp
SPIE Involvement:
Conference Program Committee | Author
Publications (20)

PROCEEDINGS ARTICLE | March 10, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Data modeling, Scanners, Error analysis, Control systems, Scatterometry, Finite element methods, Neural networks, Critical dimension metrology, Semiconducting wafers, Scatter measurement

SPIE Journal Paper | October 1, 2009
JM3 Vol. 8 Issue 04
KEYWORDS: Extreme ultraviolet lithography, Lithography, Integrated circuits, Scanners, Manufacturing, Photomasks, Electronic design automation, Optics manufacturing, Chemical elements, X-ray lithography

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Lithography, Light sources, Reticles, Reflectivity, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, EUV optics

PROCEEDINGS ARTICLE | March 13, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Light sources, Reticles, Reflectivity, Wavefront sensors, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

PROCEEDINGS ARTICLE | March 10, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Mirrors, Reticles, Polishing, Particles, Coating, Reflectivity, Projection systems, Extreme ultraviolet lithography, Surface finishing, EUV optics

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Electron beam lithography, Electron beams, Optical lithography, Etching, Silicon, Manufacturing, Printing, Photomasks, Semiconducting wafers, Projection lithography

Showing 5 of 20 publications
Conference Committee Involvement (9)
Extreme Ultraviolet (EUV) Lithography II
28 February 2011 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography
22 February 2010 | San Jose, California, United States
Alternative Lithographic Technologies
24 February 2009 | San Jose, California, United States
Emerging Lithographic Technologies XII
26 February 2008 | San Jose, California, United States
Emerging Lithographic Technologies XI
27 February 2007 | San Jose, California, United States
Showing 5 of 9 published special sections
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