Dr. Martin Eisner Profile

Dr. Martin Eisner

at Focuslight Switzerland SA

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 30 August 2019 Presentation + Paper

Leveraging wafer-level manufacturing process limitations to increase large-scale fused silica microlens array uniformity

Raoul Kirner, Jeremy Béguelin, Wilfried Noell, Martin Eisner, Toralf Scharf, Reinhard Voelkel

Proceedings Volume 11103, 111030A (2019) https://doi.org/10.1117/12.2529195

KEYWORDS: Microlens, Picture Archiving and Communication System, Microlens array, Wafer-level optics, Manufacturing, Optics manufacturing, Tolerancing, Reactive ion etching, Semiconducting wafers

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Proceedings Article | 18 December 2012 Paper

High numerical aperture silicon collimating lens for mid-infrared quantum cascade lasers manufactured using wafer-level techniques

Eric Logean, Lubos Hvozdara, Joab Di-Francesco, Hans Peter Herzig, Reinhard Voelkel, Martin Eisner, Pierre-Yves Baroni, Michel Rochat, Antoine Müller

Proceedings Volume 8550, 85500Q (2012) https://doi.org/10.1117/12.981165

KEYWORDS: Silicon, Quantum cascade lasers, Semiconducting wafers, Mid-IR, Etching, Photoresist processing, Aspheric lenses, Manufacturing, Reactive ion etching, Micro optics

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Proceedings Article | 30 September 2011 Paper

Wafer-level micro-optics: trends in manufacturing, testing, and packaging

Reinhard Voelkel, Kenneth Weible, Martin Eisner

Proceedings Volume 8169, 81690C (2011) https://doi.org/10.1117/12.897114

KEYWORDS: Micro optics, Semiconducting wafers, Microlens, Manufacturing, Diffractive optical elements, Microlens array, Photomasks, Lithography, Packaging, Etching

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Proceedings Article | 12 September 2008 Paper

Randomly varying micro-optical elements for the generation of uniform intensity profiles in coherent laser sources

K. Weible, A. Bich, S. Roth, C. Dumouchel, P. Pernet, M. Eisner, R. Völkel, R. Bitterli, T. Scharf, W. Noell

Proceedings Volume 7062, 70620R (2008) https://doi.org/10.1117/12.795926

KEYWORDS: Diffusers, Microlens array, Microlens, Beam homogenizers, Homogenization, Eye, Laser sources, Spherical lenses, Light sources, Collimation

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Proceedings Article | 14 February 2008 Paper

Multifunctional micro-optical elements for laser beam homogenizing and beam shaping

A. Bich, J. Rieck, C. Dumouchel, S. Roth, K. Weible, M. Eisner, R. Voelkel, M. Zimmermann, M. Rank, M. Schmidt, R. Bitterli, N. Ramanan, P. Ruffieux, T. Scharf, W. Noell, H.-P. Herzig, Nico De Rooij

Proceedings Volume 6879, 68790Q (2008) https://doi.org/10.1117/12.762923

KEYWORDS: Diffusers, Microlens array, Microlens, Beam homogenizers, Laser applications, Homogenization, Telescopes, Beam shaping, Diffraction, Mirrors

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Proceedings Article | 14 October 2005 Paper

Micro-optics: manufacturing and characterization

R. Voelkel, M. Eisner, K. Weible

Proceedings Volume 5965, 596501 (2005) https://doi.org/10.1117/12.624133

KEYWORDS: Micro optics, Microlens, Manufacturing, Semiconducting wafers, Microlens array, Diffraction, Semiconductors, Coating, Interferometers, Optics manufacturing

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Proceedings Article | 17 August 2004 Paper

Metrology of refractive microlens arrays

Kenneth Weible, Reinhard Volkel, Martin Eisner, Samuel Hoffmann, Toralf Scharf, Hans-Peter Herzig

Proceedings Volume 5458, (2004) https://doi.org/10.1117/12.545458

KEYWORDS: Microlens, Microlens array, Interferometers, Aspheric lenses, Spherical lenses, Metrology, Wavefronts, Optical spheres, Reactive ion etching, Semiconducting wafers

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Proceedings Article | 9 November 2001 Paper

Fabrication of aspherical microlenses in fused silica and silicon

Reinhard Voelkel, Martin Eisner, Kenneth Weible

Proceedings Volume 4440, (2001) https://doi.org/10.1117/12.448056

KEYWORDS: Microlens, Silica, Reactive ion etching, Silicon, Microlens array, Etching, Aspheric lenses, Optical lithography, Semiconducting wafers, Fabrication

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Proceedings Article | 18 August 2000 Paper

Refractive microlenses for ultraflat photolithographic projection systems

Reinhard Voelkel, Martin Eisner, Christian Ossmann, Kenneth Weible

Proceedings Volume 4179, (2000) https://doi.org/10.1117/12.395683

KEYWORDS: Microlens, Microlens array, Photomasks, Reactive ion etching, Projection lithography, Projection systems, Silica, Semiconducting wafers, Optical lithography, Etching

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SPIE Journal Paper | 1 October 1996

Transferring resist microlenses into silicon by reactive ion etching

Martin Eisner, Johannes Schwider

OE, Vol. 35, Issue 10, (October 1996) https://doi.org/10.1117/12.10.1117/1.600981

KEYWORDS: Etching, Silicon, Microlens, Lenses, Reactive ion etching, Ions, Photoresist processing, Spherical lenses, Glasses, Optical spheres

Proceedings Article | 12 October 1994 Paper

Reactive ion etching of microlens arrays into fused silica

Stefan Haselbeck, Martin Eisner, Horst Schreiber, Johannes Schwider

Proceedings Volume 2169, (1994) https://doi.org/10.1117/12.190220

KEYWORDS: Etching, Reactive ion etching, Photoresist materials, Silica, Microlens array, Microlens, Point spread functions, Modulation transfer functions, Glasses, Gases

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Showing 5 of 11 publications

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