Niels Vergeer
at Mapper Lithography
SPIE Involvement:
Publications (4)

Proceedings Article | 27 April 2017 Presentation
Ludovic Lattard, Isabelle Servin, Jonathan Pradelles, Yoann Blancquaert, Guido Rademaker, Laurent Pain, Guido de Boer, Pieter Brandt, Michel Dansberg, Remco J. Jager, Jerry J. Peijster, Erwin Slot, Stijn W. H. Steenbrink, Niels Vergeer, Marco Wieland
Proceedings Volume 10144, 101440N (2017)
KEYWORDS: Semiconducting wafers, Lithography, Electron beam lithography, Photomasks, Switching, Electron beams, Lithographic illumination, Integrated optics, Optical alignment, Wafer-level optics

Proceedings Article | 2 April 2014 Paper
Ludovic Lattard, Jonathan Pradelles, Niels Vergeer, Erwin Slot, Laurent Pain, Erik de Jong, Gianpaolo Torriani, Charles Pieczulewski
Proceedings Volume 9050, 90502E (2014)
KEYWORDS: Semiconducting wafers, Optical alignment, Lithography, Sensors, Cooling systems, Electron beam lithography, Interferometers, Manufacturing, Electron beams, Interfaces

Proceedings Article | 26 March 2013 Paper
N. Vergeer, L. Lattard, G. de Boer, F. Couweleers, D. Dave, J. Pradelles, J. Bustos
Proceedings Volume 8680, 86801E (2013)
KEYWORDS: Optical alignment, Semiconducting wafers, Sensors, Reflectivity, Reflection, System on a chip, Lithography, Wafer-level optics, Silicon, Maskless lithography

Proceedings Article | 2 April 2011 Paper
C. van den Berg, G. de Boer, S. Boschker, E. Hakkennes, G. Holgate, M. Hoving, R. Jager, J. Koning, V. Kuiper, Yue Ma, I. van Mil, H. W. Mook, T. Ooms, T. van de Peut, S. Postma, M. Sanderse, P. Scheffers, E. Slot, A. Tudorie, A. M. Valkering, N. Venema, N. Vergeer, A. Weirsma, S. Woutersen, M. Wieland, B. Kampherbeek
Proceedings Volume 7970, 79700D (2011)
KEYWORDS: Interferometers, Electron beams, Optical testing, Semiconducting wafers, Error analysis, Lithography, Sensors, Wafer-level optics, Control systems, Chemically amplified resists

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