Dr. Patrick Helfenstein Profile

Dr. Patrick Helfenstein

at Paul Scherrer Institut

SPIE Involvement:

Author

Publications (17)

Proceedings Article | 26 March 2019 Presentation + Paper

Absorber and phase defect inspection on EUV reticles using RESCAN

Iacopo Mochi, Sara Fernandez, Ricarda Nebling, Uldis Locans, Patrick Helfenstein, Rajendran Rajeev, Atoosa Dejkameh, Dimitrios Kazazis, Li-Ting Tseng, Yasin Ekinci

Proceedings Volume 10957, 109570W (2019) https://doi.org/10.1117/12.2515160

KEYWORDS: Inspection, Extreme ultraviolet, Reticles, Photomasks, Defect detection, Defect inspection, Phase measurement, Microscopes

Read Abstract +

SPIE Journal Paper | 18 March 2019

Comparative study of extreme ultraviolet absorber materials using lensless actinic imaging

Sara Fernandez, Dimitrios Kazazis, Rajeev Rajendran, Iacopo Mochi, Patrick Helfenstein, Shusuke Yoshitake, Yasin Ekinci

JM3, Vol. 18, Issue 01, 013506, (March 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.013506

KEYWORDS: Photomasks, Nickel, Extreme ultraviolet, Inspection, Signal to noise ratio, Line edge roughness, Extreme ultraviolet lithography, Reflectivity, Image acquisition, Diffraction

Read Abstract +

SPIE Journal Paper | 13 March 2019

Experimental evaluation of the impact of carbon nanotube EUV pellicles on reticle imaging

Iacopo Mochi, Marina Timmermans, Emily Gallagher, Marina Mariano, Ivan Pollentier, Rajeev Rajendran, Patrick Helfenstein, Sara Fernandez, Dimitrios Kazazis, Yasin Ekinci

JM3, Vol. 18, Issue 01, 014002, (March 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.014002

KEYWORDS: Pellicles, Extreme ultraviolet, Scattering, Reticles, Diffraction, Image quality, Inspection, Coating, Photomasks, Carbon nanotubes

Read Abstract +

Proceedings Article | 15 October 2018 Presentation + Paper

Phase defect inspection on EUV masks using RESCAN

Rajendran Rajeev, Iacopo Mochi, Dimitrios Kazazis, Sara Fernandez, Tseng Li-Teng, Patrick Helfenstein, Yasin Ekinci

Proceedings Volume 10809, 108090Q (2018) https://doi.org/10.1117/12.2502726

KEYWORDS: Extreme ultraviolet, Photomasks, Inspection, Defect inspection, Reticles, Diffraction, System on a chip, Image restoration, Extreme ultraviolet lithography, High volume manufacturing

Read Abstract +

Proceedings Article | 3 October 2018 Presentation + Paper

Experimental evaluation of the impact of EUV pellicles on reticle imaging

Iacopo Mochi, Marina Timmermans, Emily Gallagher, Marina Mariano Juste, Ivan Pollentier, Rajendran Rajeev, Patrick Helfenstein, Sara Fernandez, Dimitrios Kazazis, Yasin Ekinci

Proceedings Volume 10810, 108100Y (2018) https://doi.org/10.1117/12.2502480

KEYWORDS: Pellicles, Extreme ultraviolet, Scattering, Diffraction, Reticles, Image quality, Inspection, Coating

Read Abstract +

Proceedings Article | 20 March 2018 Paper

A comparative study of EUV absorber materials using lensless actinic imaging of EUV photomasks

S. Fernandez, D. Kazazis, R. Rajeev, I. Mochi, P. Helfenstein, S. Yoshitake, Y. Ekinci

Proceedings Volume 10583, 105831H (2018) https://doi.org/10.1117/12.2297381

KEYWORDS: Photomasks, Extreme ultraviolet, Nickel, Inspection, Signal to noise ratio, Extreme ultraviolet lithography, Phase measurement, Optical properties, Mirrors, Absorption

Read Abstract +

Proceedings Article | 19 March 2018 Presentation + Paper

Through-pellicle inspection of EUV masks

Iacopo Mochi, Rajendran Rajeev, Patrick Helfenstein, Sara Fernandez, Dimitrios Kazazis, Yasin Ekinci

Proceedings Volume 10583, 105831I (2018) https://doi.org/10.1117/12.2297436

KEYWORDS: Pellicles, Extreme ultraviolet, Inspection, Reticles, Silicon, Reconstruction algorithms, Diffraction, Photomasks, Extreme ultraviolet lithography, Microscopes

Read Abstract +

Proceedings Article | 19 March 2018 Presentation

High-throughput defect inspection for arbitrarily shaped EUV absorber patterns (Conference Presentation)

Patrick Helfenstein, Iacopo Mochi, Rajendran Rajeev, Sara Fernandez, Dimitrios Kazazis, Yasin Ekinci

Proceedings Volume 10585, 1058509 (2018) https://doi.org/10.1117/12.2297587

KEYWORDS: Extreme ultraviolet, Defect inspection, Inspection, Reflectivity, Microscopes, Signal to noise ratio, Deconvolution

Read Abstract +

Proceedings Article | 16 October 2017 Presentation + Paper

Actinic inspection of EUV reticles with arbitrary pattern design

Iacopo Mochi, Patrick Helfenstein, Rajendran Rajeev, Sara Fernandez, Dimitrios Kazazis, Shusuke Yoshitake, Yasin Ekinci

Proceedings Volume 10450, 1045007 (2017) https://doi.org/10.1117/12.2280528

KEYWORDS: Inspection, Diffraction, Extreme ultraviolet, Sensors, Defect inspection, Reticles, Defect detection, Signal to noise ratio, Photomasks, Reconstruction algorithms

Read Abstract +

SPIE Journal Paper | 27 July 2017

RESCAN: an actinic lensless microscope for defect inspection of EUV reticles

Iacopo Mochi, Patrick Helfenstein, Istvan Mohacsi, Rajeev Rajendran, Dimitrios Kazazis, Shusuke Yoshitake, Yasin Ekinci

JM3, Vol. 16, Issue 04, 041003, (July 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.041003

Read Abstract +

Proceedings Article | 28 March 2017 Presentation + Paper

Towards a stand-alone high-throughput EUV actinic photomask inspection tool: RESCAN

Rajeev Rajendran, Iacopo Mochi, Patrick Helfenstein, Istvan Mohacsi, Sophie Redford, Aldo Mozzanica, Bernd Schmitt, Shushuke Yoshitake, Yasin Ekinci

Proceedings Volume 10145, 101450N (2017) https://doi.org/10.1117/12.2258379

KEYWORDS: Extreme ultraviolet, Photomasks, Metrology, Sensors, Inspection, Extreme ultraviolet lithography, Reticles, Lithography, Scanners, High volume manufacturing, Diffraction, Photons, Scattering, Image restoration, Defect detection, Prototyping

Read Abstract +

Proceedings Article | 27 March 2017 Paper

A two-step method for fast and reliable EUV mask metrology

Patrick Helfenstein, Iacopo Mochi, Rajeev Rajendran, Shusuke Yoshitake, Yasin Ekinci

Proceedings Volume 10143, 101431Q (2017) https://doi.org/10.1117/12.2259961

KEYWORDS: Photomasks, Extreme ultraviolet, Metrology, Coherence imaging, Inspection, Lithography, Microscopy, Defect detection, Extreme ultraviolet lithography, High volume manufacturing, Sensors, Diffraction, Mirrors, Charge-coupled devices, Spherical lenses, Image resolution

Read Abstract +

Proceedings Article | 24 March 2017 Paper

RESCAN: an actinic lensless microscope for defect inspection of EUV reticles

Iacopo Mochi, Patrick Helfenstein, Istvan Mohacsi, Rajeev Rajendran, Shusuke Yoshitake, Yasin Ekinci

Proceedings Volume 10143, 101431O (2017) https://doi.org/10.1117/12.2258086

KEYWORDS: Photomasks, Defect inspection, Extreme ultraviolet, Reticles, Microscopes, Inspection, Image resolution, Imaging systems, Scattering, Diffraction, Sensors, Defect detection, Prototyping

Read Abstract +

Proceedings Article | 5 October 2016 Paper

Scanning coherent scattering methods for actinic EUV mask inspection

Y. Ekinci, P. Helfenstein, R. Rajeev, I. Mochi, I. Mohacsi, J. Gobrecht, S. Yoshitake

Proceedings Volume 9985, 99851P (2016) https://doi.org/10.1117/12.2242961

KEYWORDS: Photomasks, Extreme ultraviolet, Inspection, Diffraction, Scattering, Light scattering, Microscopy, Sensors, Metrology, Signal to noise ratio

Read Abstract +

SPIE Journal Paper | 16 September 2016 Open Access

Scanning coherent diffractive imaging methods for actinic extreme ultraviolet mask metrology

Patrick Helfenstein, Istvan Mohacsi, Rajendran Rajeev, Yasin Ekinci

JM3, Vol. 15, Issue 03, 034006, (September 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.3.034006

KEYWORDS: Extreme ultraviolet, Photomasks, Coherence imaging, Sensors, Metrology, Diffraction, Reconstruction algorithms, Image resolution, Microscopy, Detection and tracking algorithms

Read Abstract +

DOWNLOAD PAPER

Proceedings Article | 24 March 2016 Paper

Scanning scattering contrast microscopy for actinic EUV mask inspection

I. Mohacsi, P. Helfenstein, R. Rajendran, Y. Ekinci

Proceedings Volume 9778, 97781O (2016) https://doi.org/10.1117/12.2220027

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Metrology, Extreme ultraviolet lithography, Diffraction, Scattering, Microscopy, Lithography, Light scattering, Laser scattering

Read Abstract +

Proceedings Article | 18 March 2016 Paper

Scanning coherent diffractive imaging methods for actinic EUV mask metrology

Patrick Helfenstein, Istvan Mohacsi, Rajeev Rajendran, Yasin Ekinci

Proceedings Volume 9776, 97761F (2016) https://doi.org/10.1117/12.2219937

KEYWORDS: Photomasks, Extreme ultraviolet, Coherence imaging, Metrology, Sensors, Inspection, Nanotechnology, Extreme ultraviolet lithography, Lithography, Defect detection, Diffraction, Reconstruction algorithms, Image resolution, Detection and tracking algorithms

Read Abstract +

Showing 5 of 17 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years