Dr. Stanley E. Stokowski
Consultant at Stokowski and Associates
SPIE Involvement:
Conference Program Committee | Author
Publications (15)

PROCEEDINGS ARTICLE | May 26, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Optical spheres, Defect detection, Deep ultraviolet, Silica, Quartz, Particles, Inspection, Photomasks, Extreme ultraviolet, Defect inspection

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Signal to noise ratio, Optical spheres, Defect detection, Deep ultraviolet, Silica, Quartz, Particles, Inspection, Photomasks, Extreme ultraviolet

PROCEEDINGS ARTICLE | November 9, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Deep ultraviolet, Spatial frequencies, Image processing, Inspection, Image analysis, Photomasks, Critical dimension metrology, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Inspection, Reflectivity, Optical inspection, Image transmission, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Charged-particle lithography

PROCEEDINGS ARTICLE | May 28, 2003
Proc. SPIE. 5148, 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents
KEYWORDS: Lithography, Phase contrast, Defect detection, Detection and tracking algorithms, Etching, Quartz, Inspection, Phase shift keying, Photomasks, Phase shifts

PROCEEDINGS ARTICLE | December 27, 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Modulation, Glasses, Inspection, Reflectivity, Optical inspection, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Autoregressive models

Showing 5 of 15 publications
Conference Committee Involvement (6)
Extreme Ultraviolet (EUV) Lithography IV
25 February 2013 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography III
13 February 2012 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography II
28 February 2011 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography
22 February 2010 | San Jose, California, United States
Photomask Technology
3 October 2005 | Monterey, California, United States
Showing 5 of 6 published special sections
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