Mr. Stefan Helbig Profile

Stefan Helbig

Sales Representative at HamaTech AG

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Author

Publications (5)

Proceedings Article | 11 May 2009 Paper

Study on surface integrity in photomask resist strip and final cleaning processes

Sherjang Singh, Stefan Helbig, Peter Dress, Uwe Dietze

Proceedings Volume 7379, 73790D (2009) https://doi.org/10.1117/12.824254

KEYWORDS: Ozone, Ruthenium, Photomasks, Photoresist processing, Reflectivity, Metals, Critical dimension metrology, Extreme ultraviolet lithography, Hydrogen, Oxidation

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Proceedings Article | 17 October 2008 Paper

Impact of MegaSonic process conditions on PRE and sub-resolution assist feature damage

Stefan Helbig, Sabine Urban, Elizabeth Klein, Sherjang Singh

Proceedings Volume 7122, 712210 (2008) https://doi.org/10.1117/12.801408

KEYWORDS: SRAF, Cavitation, Photomasks, Acoustics, Sonoluminescence, Particles, Glasses, Inspection, Scanning electron microscopy, Mask cleaning

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Proceedings Article | 8 November 2005 Paper

Influence of organic contamination on photomask performance

Christian Chovino, Stefan Helbig, Wolfgang Dieckmann, Karsten Bubke, Peter Dress

Proceedings Volume 5992, 59923F (2005) https://doi.org/10.1117/12.632053

KEYWORDS: Photomasks, Reflection, Contamination, Reflectivity, Optical properties, Spectroscopy, Sensors, Natural surfaces, Reticles, Printing

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Proceedings Article | 8 November 2005 Paper

Investigation of sulfate-free clean processes for next generation lithography

Christian Chovino, Stefan Helbig, Petr Haschke, Werner Saule

Proceedings Volume 5992, 59923E (2005) https://doi.org/10.1117/12.632055

KEYWORDS: Scanning probe microscopy, Photomasks, Particles, Chemistry, Hydrogen, Reflectivity, Ozone, Crystals, Contamination, Lithography

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Proceedings Article | 28 June 2005 Paper

AUV5500: advanced in situ dry cleaning and metrology process for next generation lithography

Christian Chovino, Stefan Helbig, Peter Dress

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617119

KEYWORDS: Reflectivity, Ultraviolet radiation, Spectroscopy, Photomasks, Reflection, Contamination, Quartz, Reticles, Particles, Optical properties

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