Stefan Helbig
Sales Representative at HamaTech AG
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Metals, Hydrogen, Reflectivity, Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Ozone, Photoresist processing, Ruthenium, Oxidation

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Glasses, Particles, Inspection, Scanning electron microscopy, Photomasks, SRAF, Cavitation, Acoustics, Mask cleaning, Sonoluminescence

PROCEEDINGS ARTICLE | November 8, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Contamination, Particles, Crystals, Hydrogen, Chemistry, Reflectivity, Photomasks, Scanning probe microscopy, Ozone

PROCEEDINGS ARTICLE | November 8, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Contamination, Optical properties, Reflection, Sensors, Spectroscopy, Reflectivity, Printing, Photomasks, Natural surfaces

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Reticles, Contamination, Optical properties, Reflection, Quartz, Spectroscopy, Ultraviolet radiation, Particles, Reflectivity, Photomasks

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