Dr. Stephane Godny
at imec
SPIE Involvement:
Publications (4)

Proceedings Article | 24 March 2016 Paper
Anil Gunay-Demirkol, Efrain Altamirano Sanchez, Stephane Heraud, Stephane Godny, Anne-Laure Charley, Philippe Leray, Ronen Urenski, Oded Cohen, Igor Turovets, Shay Wolfling
Proceedings Volume 9778, 977807 (2016) https://doi.org/10.1117/12.2220287
KEYWORDS: Semiconducting wafers, Scatterometry, Etching, Critical dimension metrology, Diffractive optical elements, Metrology, Optical lithography, Scatter measurement, Process control, Lithography

Proceedings Article | 10 April 2015 Paper
Proceedings Volume 9424, 94240D (2015) https://doi.org/10.1117/12.2086084
KEYWORDS: Metrology, Scanning electron microscopy, Diffraction gratings, Overlay metrology, Uncertainty analysis, Performance modeling, Diffraction, Scatterometry, Critical dimension metrology, Image processing

Proceedings Article | 10 April 2013 Paper
Stephane Godny, Masafumi Asano, Akiko Kawamoto, Koichi Wakamoto, Kazuto Matsuki, Cornel Bozdog, Matthew Sendelbach, Igor Turovets, Ronen Urenski, Renan Milo
Proceedings Volume 8681, 86812D (2013) https://doi.org/10.1117/12.2012660
KEYWORDS: Metrology, Critical dimension metrology, Scanning transmission electron microscopy, Semiconducting wafers, Lithography, Polymers, Process control, Chemical elements, Geometrical optics, Directed self assembly

Proceedings Article | 10 April 2013 Paper
Masafumi Asano, Akiko Kawamoto, Kazuto Matsuki, Stephane Godny , Tingsheng Lin, Koichi Wakamoto
Proceedings Volume 8681, 86812C (2013) https://doi.org/10.1117/12.2010887
KEYWORDS: Nanoimprint lithography, Lithography, Metrology, Critical dimension metrology, Etching, 3D metrology, Coating, Process control, Transmission electron microscopy, Directed self assembly

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