Dr. Philippe Leray
Group leader of Advanced Metrology at imec
SPIE Involvement:
Conference Program Committee | Author
Publications (126)

Proceedings Article | 22 November 2023 Presentation
Proceedings Volume PC12751, PC127510Q (2023) https://doi.org/10.1117/12.2687822
KEYWORDS: Optical proximity correction, Photomasks, Extreme ultraviolet, Calibration, Semiconducting wafers, Scanning electron microscopy, Printing, Modeling, Machine learning, Data modeling

Proceedings Article | 21 November 2023 Poster + Paper
Proceedings Volume 12750, 1275010 (2023) https://doi.org/10.1117/12.2687639
KEYWORDS: Signal to noise ratio, Scanning electron microscopy, Deep learning, Image analysis, Extreme ultraviolet lithography, Denoising, Time metrology, Spectral density, Semiconductors, Semiconductor manufacturing

SPIE Journal Paper | 19 October 2023
Victor Blanco Carballo, Etienne De Poortere, Philippe Leray, Dorin Cerbu, Jeroen van de Kerkhove, Nicola Kissoon
JM3, Vol. 22, Issue 04, 041604, (October 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041604
KEYWORDS: Metals, Design rules, Design, Critical dimension metrology, Scanning electron microscopy, Diffractive optical elements, Extreme ultraviolet, Etching, Optical lithography, Transmission electron microscopy

Proceedings Article | 30 April 2023 Presentation
Janusz Bogdanowicz, Anne-Laure Charley, Philippe Leray
Proceedings Volume 12496, 1249617 (2023) https://doi.org/10.1117/12.2666926
KEYWORDS: Metrology, 3D metrology, Semiconductors, 3D equipment, Silicon, Scanning electron microscopy, Overlay metrology, Gallium arsenide, Field effect transistors, X-rays

Proceedings Article | 28 April 2023 Poster + Paper
Proceedings Volume 12494, 1249414 (2023) https://doi.org/10.1117/12.2657917
KEYWORDS: Optical lithography, Semiconducting wafers, Lithography, Back end of line, Resistance, Extreme ultraviolet lithography, Etching, Critical dimension metrology

Showing 5 of 126 publications
Conference Committee Involvement (6)
Metrology, Inspection, and Process Control XXXVIII
26 February 2024 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVII
27 February 2023 | San Jose, California, United States
Metrology, Inspection, and Process Control XXXVI
25 April 2022 | San Jose, California, United States
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
22 February 2021 | Online Only, California, United States
Metrology, Inspection, and Process Control for Microlithography XXXIV
24 February 2020 | San Jose, California, United States
Showing 5 of 6 Conference Committees
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