Mr. Wataru Shibayama
at Nissan Chemical Industries Ltd
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Optical lithography, Contamination, Etching, Dry etching, Polymers, Materials processing, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Carbon, Lithography, Optical lithography, Etching, Silicon, Materials processing, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, System on a chip

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Optical lithography, Etching, Dry etching, Silicon, Materials processing, Electroluminescence, Line width roughness, Extreme ultraviolet lithography, Immersion lithography, Photoresist processing, System on a chip, Standards development

PROCEEDINGS ARTICLE | March 21, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Optical lithography, Etching, Dry etching, Polymers, Image processing, Silicon, Materials processing, Image quality, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Carbon, Lithography, Optical lithography, Etching, Dry etching, Silicon, Materials processing, Resistance, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, System on a chip

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Roentgenium, Etching, Silicon, Chromophores, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, System on a chip

Showing 5 of 8 publications
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