Mr. Wataru Shibayama
at Nissan Chemical Industries Ltd
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Lithography, Optical lithography, Etching, Dry etching, Polymers, Materials processing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Optical lithography, Contamination, Etching, Dry etching, Polymers, Materials processing, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Carbon, Optical lithography, Contamination, Etching, Materials processing, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, System on a chip

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Carbon, Lithography, Optical lithography, Etching, Silicon, Materials processing, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, System on a chip

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Optical lithography, Etching, Dry etching, Silicon, Materials processing, Electroluminescence, Line width roughness, Extreme ultraviolet lithography, Immersion lithography, Photoresist processing, System on a chip, Standards development

PROCEEDINGS ARTICLE | March 21, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Lithography, Optical lithography, Etching, Dry etching, Polymers, Image processing, Silicon, Materials processing, Image quality, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Showing 5 of 10 publications
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