Dr. Alan Hayes
at Applied Materials Inc
SPIE Involvement:
Area of Expertise:
Thin film , etching , ion source , ion beam , deposition , EUV
Publications (5)

Proceedings Article | 17 April 2014 Paper
Proceedings Volume 9048, 90480H (2014) https://doi.org/10.1117/12.2048541
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Inspection, Ruthenium, Failure analysis, Transmission electron microscopy, Ions, Silica, Multilayers

Proceedings Article | 7 April 2011 Paper
V. Jindal, P. Kearney, Jenah Harris-Jones, Alan Hayes, Jacques Kools
Proceedings Volume 7969, 79691A (2011) https://doi.org/10.1117/12.879467
KEYWORDS: Chemical species, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Silicon, Molybdenum, Deposition processes, Monte Carlo methods, Multilayers, Particles

Proceedings Article | 27 May 2009 Paper
Patrick Kearney, C. C. Lin, Takashi Sugiyama, Henry Yun, Rajul Randive, Ira Reiss, Alan Hayes, Paul Mirkarimi, Eberhard Spiller
Proceedings Volume 7470, 74700X (2009) https://doi.org/10.1117/12.835195
KEYWORDS: Etching, Photomasks, Extreme ultraviolet lithography, Ion beams, Inspection, Extreme ultraviolet, Deposition processes, Particles, Manufacturing, Ions

Proceedings Article | 17 October 2008 Paper
A. Hayes, R. Randive, I. Reiss, J. Menendez, P. Kearney, T. Sugiyama
Proceedings Volume 7122, 71223O (2008) https://doi.org/10.1117/12.801870
KEYWORDS: Particles, Photomasks, Aluminum, Contamination, Extreme ultraviolet, Chromium, Electrodes, Silicon, Iron, Particle contamination

Proceedings Article | 17 December 2003 Paper
Andy Ma, Kevin Kemp, Rajul Randive, Al Weaver, Mark Roberti, Alan Hayes, Daniel Abraham, Paul Mirkarimi, Eberhard Spiller, Patrick Kearney
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.535866
KEYWORDS: Reflectivity, Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Multilayers, Silicon, Coating, Quartz, Ions, Ion beams

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