Bilal Chehab
at imec
SPIE Involvement:
Publications (6)

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12052, 120520F (2022)
KEYWORDS: Metals, Fin field effect transistors, Semiconducting wafers, Optical lithography, 3D imaging standards, Integrated circuits, CMOS devices, Standards development, Field effect transistors, Etching

Proceedings Article | 25 May 2022 Presentation + Paper
A. Gupta, Z. Tao, D. Radisic, H. Mertens, O. Varela Pedreira, S. Demuynck, J. Bömmels, K. Devriendt, N. Heylen, S. Wang, K. Kenis, L. Teugels, F. Sebaai, C. Lorant, N. Jourdan, B. Chan, S. Subramanian, F. Schleicher, A. Peter, N. Rassoul, Y. Siew, B. Briggs, D. Zhou, E. Rosseel, E. Capogreco, G. Mannaert, A. Sepúlveda, E. Dupuy, K. Vandersmissen, B. Chehab, G. Murdoch, E. Altamirano Sanchez, S. Biesemans, Zs. Tőkei, E. Dentoni Litta, N. Horiguchi
Proceedings Volume 12056, 120560B (2022)
KEYWORDS: Ruthenium, Metals, Molybdenum, Etching, Tungsten, Front end of line, Chemical mechanical planarization, Silicon

Proceedings Article | 22 April 2021 Presentation + Paper
Bilal Chehab, Julien Ryckaert, Pieter Schuddinck, Pieter Weckx, Naoto Horiguchi, Gioele Mirabelli, Alessio Spessot, Myunghee Na
Proceedings Volume 11614, 116140D (2021)
KEYWORDS: Back end of line, Standards development, Metals, Field effect transistors, Multiplexers, Logic, Fin field effect transistors, Dielectrics, Control systems, Clocks

Proceedings Article | 25 March 2020 Presentation
Proceedings Volume 11328, 113280P (2020)

Proceedings Article | 23 March 2020 Presentation + Paper
Pieter Weckx, Bilal Chehab, Julien Ryckaert, Diederik Verkest, Alessio Spessot
Proceedings Volume 11328, 113280A (2020)
KEYWORDS: Standards development, Metals, 3D imaging standards, Logic, System on a chip, Back end of line, Semiconducting wafers, Optical lithography, Wafer bonding, Fin field effect transistors

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