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Eugene A. Delarosa
Retired
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Publications (1)
Proceedings Article | 11 March 2002 Paper
ArF (193-nm) alternating aperture PSM quartz defect repair and printability for 100-nm node
Jerry Chen, John Riddick, Matt Lamantia, Azeddine Zerrade, Robert Henderson, Greg Hughes, Cyrus Tabery, Khoi Phan, Chris Spence, Amy Winder, William Stanton, Eugene Delarosa, John Maltabes, Cecilia Philbin, Lloyd Litt, Anthony Vacca, Scott Pomeroy
Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458362
KEYWORDS: Quartz, Photomasks, Semiconducting wafers, Scanning electron microscopy, Etching, Atomic force microscopy, Ions, Reticles, Inspection, Critical dimension metrology
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