Hartmut Kirsch
R&D Manager
SPIE Involvement:
Publications (6)

Proceedings Article | 30 October 2007 Paper
John Nogatch, Hartmut Kirsch, Kamal Mostafa, Glenn Newell, Johnny Yeap
Proceedings Volume 6730, 67303G (2007) https://doi.org/10.1117/12.746776
KEYWORDS: Computing systems, Computer aided design, Parallel computing, Photomasks, Optical proximity correction, Data storage, Distributed computing, Reticles, Semiconducting wafers, Parallel processing

Proceedings Article | 11 May 2007 Paper
Proceedings Volume 6607, 66070W (2007) https://doi.org/10.1117/12.728946
KEYWORDS: Data conversion, Manufacturing, Data processing, Inspection, Beam shaping, Data modeling, Photomasks, Computing systems, Explosives, Data storage

Proceedings Article | 19 July 2000 Paper
Anja Rosenbusch, Vicky Bailey, Yair Eran, Reuven Falah, Shirley Hamar, Neil Holmes, Andrew Hourd, Hartmut Kirsch, Andrew McArthur
Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392071
KEYWORDS: Inspection, Photomasks, Reticles, Critical dimension metrology, Mask making, Databases, Computer aided design, Optical proximity correction, Defect detection, Resolution enhancement technologies

Proceedings Article | 30 December 1999 Paper
Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373347
KEYWORDS: Photomasks, Optical proximity correction, Mask making, Opacity, Reticles, Semiconducting wafers, Inspection, Image quality standards, Scanning electron microscopy, Computer aided design

Proceedings Article | 26 July 1999 Paper
Anja Rosenbusch, Andrew Hourd, Casper Juffermans, Hartmut Kirsch, Frederic Lalanne, Wilhelm Maurer, Carmelo Romeo, Kurt Ronse, Patrick Schiavone, Michal Simecek, Olivier Toublan, Tom Vermeulen, John Watson, Wolfram Ziegler, Rainer Zimmermann
Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354378
KEYWORDS: Optical proximity correction, Etching, Semiconducting wafers, Inspection, Deep ultraviolet, Reticles, Critical dimension metrology, Manufacturing, Mathematical modeling, Mask making

Showing 5 of 6 publications
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