Prof. Hee-Youl Lim
at SK Hynix Inc
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Optical lithography, Scanners, Manufacturing, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Overlay metrology

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Optical lithography, Data modeling, Control systems, Distortion, Process control, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Diffraction, Optical lithography, Polarization, Scanners, Chromium, Transmittance, Photomasks, Nanoimprint lithography, Binary data

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Coating, Scanning electron microscopy, Photoresist materials, Photomasks, Extreme ultraviolet, Double patterning technology

PROCEEDINGS ARTICLE | April 2, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Metrology, Molecular bridges, Particles, Coating, Bridges, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Optical lithography, Etching, Photomasks, Double patterning technology, Critical dimension metrology, Neodymium, Photoresist processing, Semiconducting wafers, Overlay metrology

Showing 5 of 6 publications
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