Mr. Heng Wu Profile

Heng Wu

at IBM Thomas J. Watson Research Ctr.

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Author

Publications (3)

Proceedings Article | 8 June 2022 Presentation + Paper

Scatterometry-based methodologies for characterization of MRAM technology

M. Medikonda, D. Schmidt, M. Rizzolo, M. Breton, A. Dutta, H. Wu, E. Evarts, A. Cepler, R. Koret, I. Turovets, D. Edelstein

Proceedings Volume PC12053, PC120530J (2022) https://doi.org/10.1117/12.2614137

KEYWORDS: Metrology, Resistance, Critical dimension metrology, Chemical mechanical planarization, Logic, Data modeling, Instrument modeling, Scatterometry, Semiconducting wafers, Machine learning

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SPIE Journal Paper | 23 May 2017

Development of TiO₂ containing hardmasks through plasma-enhanced atomic layer deposition

Anuja De Silva, Indira Seshadri, Kisup Chung, Abraham Arceo, Luciana Meli, Brock Mendoza, Yasir Sulehria, Yiping Yao, Madhana Sunder, Hoa Truong, Shravan Matham, Ruqiang Bao, Heng Wu, Nelson Felix, Sivananda Kanakasabapathy

JM3, Vol. 16, Issue 02, 023504, (May 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.2.023504

KEYWORDS: Titanium dioxide, Metals, Atomic layer deposition, Optical lithography, Etching, Dry etching, Contamination, Modulation, Wet etching, Lithography

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Proceedings Article | 27 March 2017 Presentation + Paper

Development of TiO2 containing hardmasks through PEALD deposition

Anuja De Silva, Indira Seshadri, Kisup Chung, Abraham Arceo, Luciana Meli, Brock Mendoza, Yasir Sulehria, Yiping Yao, Madhana Sunder, Hao Truong, Shravan Matham, Ruqiang Bao, Heng Wu, Nelson Felix, Sivananda Kanakasabapathy

Proceedings Volume 10146, 1014615 (2017) https://doi.org/10.1117/12.2258380

KEYWORDS: Metals, Titanium, Lithography, Optical lithography, Dry etching, Etching, Photoresist materials, Titanium dioxide, Wet etching, Plasma, Carbon

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