Hung-Eil Kim
SMTS at Spansion Inc
SPIE Involvement:
Publications (13)

Proceedings Article | 17 October 2008 Paper
Lin Wang, Todd Lukanc, Makoto Takahashi, Hung-Eil Kim, Khoi Phan, Taichi Yamazaki, Yosuke Kojima, Wataru Nozaki, Takashi Haraguchi, Yoshimitsu Okuda
Proceedings Volume 7122, 71220Z (2008)
KEYWORDS: Critical dimension metrology, Photomasks, Semiconducting wafers, Optical proximity correction, Line edge roughness, Chromium, Photoresist processing, Resolution enhancement technologies, Reticles, SRAF

Proceedings Article | 26 April 2001 Paper
Marina Plat, Christopher Lyons, Amada Wilkison, Jeff Schefske, Hung-Eil Kim
Proceedings Volume 4404, (2001)
KEYWORDS: Photomasks, Critical dimension metrology, Lithography, Optical proximity correction, Monochromatic aberrations, Photoresist processing, Binary data, Back end of line, Printing, Polymers

Proceedings Article | 26 July 1999 Paper
Hung-Eil Kim, Jun-Sung Chun, Stanley Barnett, James Shih
Proceedings Volume 3679, (1999)
KEYWORDS: Photomasks, Critical dimension metrology, Binary data, Semiconducting wafers, Cadmium, Printing, Phase shifts, Image processing, Photoresist processing, Scanners

Proceedings Article | 11 June 1999 Paper
Jun-Sung Chun, Hung-Eil Kim, Stanley Barnett, James Shih
Proceedings Volume 3678, (1999)
KEYWORDS: Ions, Etching, Photoresist materials, Argon, Ion implantation, Deep ultraviolet, Photoresist processing, Resistance, Dry etching, Chemically amplified resists

Proceedings Article | 29 June 1998 Paper
Proceedings Volume 3334, (1998)
KEYWORDS: Printing, Photomasks, Critical dimension metrology, Optical proximity correction, Phase shifts, Semiconducting wafers, Etching, Defect inspection, Transmittance, Lithography

Showing 5 of 13 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top